Native defects and self-diffusion in GaSb
| dc.contributor | Aalto-yliopisto | fi |
| dc.contributor | Aalto University | en |
| dc.contributor.author | Hakala, M. | |
| dc.contributor.author | Puska, M.J. | |
| dc.contributor.author | Nieminen, R.M. | |
| dc.contributor.department | Department of Applied Physics | en |
| dc.contributor.groupauthor | Electronic Properties of Materials | en |
| dc.date.accessioned | 2025-10-08T06:41:39Z | |
| dc.date.available | 2025-10-08T06:41:39Z | |
| dc.date.issued | 2002 | |
| dc.description.abstract | The native defects in GaSb have been studied with first-principles total-energy calculations. We report the structures and the formation energies of the stable defects and estimate the defect concentrations under different growth conditions. The most important native defect is the GaSb antisite, which acts as an acceptor. The other important defects are the acceptor-type Ga vacancy and the donor-type Ga interstitial. The Sb vacancies and interstitials are found to have much higher formation energies. A metastable state is observed for the SbGa antisite. The significantly larger concentrations of the Ga vacancies and interstitials compared to the corresponding Sb defects is in accordance with the asymmetric self-diffusion behavior in GaSb. The data supports the next-nearest-neighbor model for the self-diffusion, in which the migration occurs independently in the different sublattices. Self-diffusion is dominated by moving Ga atoms. | en |
| dc.description.version | Peer reviewed | en |
| dc.format.extent | 9 | |
| dc.format.mimetype | application/pdf | |
| dc.identifier.citation | Hakala, M, Puska, M J & Nieminen, R M 2002, 'Native defects and self-diffusion in GaSb', Journal of Applied Physics, vol. 91, no. 8, pp. 4988-4994. https://doi.org/10.1063/1.1462844 | en |
| dc.identifier.doi | 10.1063/1.1462844 | |
| dc.identifier.issn | 0021-8979 | |
| dc.identifier.issn | 1089-7550 | |
| dc.identifier.other | PURE UUID: 4cd038d5-dbf9-49a4-bf87-0bd36f3953c2 | |
| dc.identifier.other | PURE ITEMURL: https://research.aalto.fi/en/publications/4cd038d5-dbf9-49a4-bf87-0bd36f3953c2 | |
| dc.identifier.other | PURE FILEURL: https://research.aalto.fi/files/14611846/1.1462844.pdf | |
| dc.identifier.uri | https://aaltodoc.aalto.fi/handle/123456789/139521 | |
| dc.identifier.urn | URN:NBN:fi:aalto-202510087702 | |
| dc.language.iso | en | en |
| dc.publisher | American Institute of Physics | |
| dc.relation.ispartofseries | Journal of Applied Physics | en |
| dc.relation.ispartofseries | Volume 91, issue 8, pp. 4988-4994 | en |
| dc.rights | openAccess | en |
| dc.subject.keyword | diffusion | |
| dc.subject.keyword | III-V semiconductors | |
| dc.subject.keyword | point defects | |
| dc.title | Native defects and self-diffusion in GaSb | en |
| dc.type | A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä | fi |
| dc.type.version | publishedVersion |
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