Native defects and self-diffusion in GaSb

dc.contributorAalto-yliopistofi
dc.contributorAalto Universityen
dc.contributor.authorHakala, M.
dc.contributor.authorPuska, M.J.
dc.contributor.authorNieminen, R.M.
dc.contributor.departmentDepartment of Applied Physicsen
dc.contributor.groupauthorElectronic Properties of Materialsen
dc.date.accessioned2025-10-08T06:41:39Z
dc.date.available2025-10-08T06:41:39Z
dc.date.issued2002
dc.description.abstractThe native defects in GaSb have been studied with first-principles total-energy calculations. We report the structures and the formation energies of the stable defects and estimate the defect concentrations under different growth conditions. The most important native defect is the GaSb antisite, which acts as an acceptor. The other important defects are the acceptor-type Ga vacancy and the donor-type Ga interstitial. The Sb vacancies and interstitials are found to have much higher formation energies. A metastable state is observed for the SbGa antisite. The significantly larger concentrations of the Ga vacancies and interstitials compared to the corresponding Sb defects is in accordance with the asymmetric self-diffusion behavior in GaSb. The data supports the next-nearest-neighbor model for the self-diffusion, in which the migration occurs independently in the different sublattices. Self-diffusion is dominated by moving Ga atoms.en
dc.description.versionPeer revieweden
dc.format.extent9
dc.format.mimetypeapplication/pdf
dc.identifier.citationHakala, M, Puska, M J & Nieminen, R M 2002, 'Native defects and self-diffusion in GaSb', Journal of Applied Physics, vol. 91, no. 8, pp. 4988-4994. https://doi.org/10.1063/1.1462844en
dc.identifier.doi10.1063/1.1462844
dc.identifier.issn0021-8979
dc.identifier.issn1089-7550
dc.identifier.otherPURE UUID: 4cd038d5-dbf9-49a4-bf87-0bd36f3953c2
dc.identifier.otherPURE ITEMURL: https://research.aalto.fi/en/publications/4cd038d5-dbf9-49a4-bf87-0bd36f3953c2
dc.identifier.otherPURE FILEURL: https://research.aalto.fi/files/14611846/1.1462844.pdf
dc.identifier.urihttps://aaltodoc.aalto.fi/handle/123456789/139521
dc.identifier.urnURN:NBN:fi:aalto-202510087702
dc.language.isoenen
dc.publisherAmerican Institute of Physics
dc.relation.ispartofseriesJournal of Applied Physicsen
dc.relation.ispartofseriesVolume 91, issue 8, pp. 4988-4994en
dc.rightsopenAccessen
dc.subject.keyworddiffusion
dc.subject.keywordIII-V semiconductors
dc.subject.keywordpoint defects
dc.titleNative defects and self-diffusion in GaSben
dc.typeA1 Alkuperäisartikkeli tieteellisessä aikakauslehdessäfi
dc.type.versionpublishedVersion

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