Mechanical and optical properties of as-grown and thermally annealed titanium dioxide from titanium tetrachloride and water by atomic layer deposition

dc.contributorAalto-yliopistofi
dc.contributorAalto Universityen
dc.contributor.authorYlivaara, Oili M.E.en_US
dc.contributor.authorLangner, Andreasen_US
dc.contributor.authorLiu, Xuwenen_US
dc.contributor.authorSchneider, Dieteren_US
dc.contributor.authorJulin, Jaakkoen_US
dc.contributor.authorArstila, Kaien_US
dc.contributor.authorSintonen, Sakarien_US
dc.contributor.authorAli, Saimaen_US
dc.contributor.authorLipsanen, Harrien_US
dc.contributor.authorSajavaara, Timoen_US
dc.contributor.authorHannula, Simo-Pekkaen_US
dc.contributor.authorPuurunen, Riikka L.en_US
dc.contributor.departmentDepartment of Chemical and Metallurgical Engineeringen
dc.contributor.departmentDepartment of Electronics and Nanoengineeringen
dc.contributor.departmentDepartment of Chemistry and Materials Scienceen
dc.contributor.groupauthorHarri Lipsanen Groupen
dc.contributor.groupauthorAdvanced and functional Materialsen
dc.contributor.groupauthorCatalysisen
dc.contributor.organizationVTT Technical Research Centre of Finlanden_US
dc.contributor.organizationFraunhofer Institute for Material and Beam Technologyen_US
dc.contributor.organizationUniversity of Jyväskyläen_US
dc.date.accessioned2021-07-01T13:09:28Z
dc.date.available2021-07-01T13:09:28Z
dc.date.issued2021-08-31en_US
dc.descriptionFunding Information: This work was carried out within the MECHALD project funded by Business Finland (Tekes) and is linked to the Finnish Centers of Excellence in Atomic Layer Deposition (ref. 251220) and Nuclear and Accelerator Based Physics (refs. 213503 and 251353) of the Academy of Finland. Funding Information: This work was carried out within the MECHALD project funded by Business Finland (Tekes) and is linked to the Finnish Centers of Excellence in Atomic Layer Deposition (ref. 251220 ) and Nuclear and Accelerator Based Physics (refs. 213503 and 251353 ) of the Academy of Finland. Publisher Copyright: © 2021
dc.description.abstractThe use of thin-films made by atomic layer deposition (ALD) is increasing in the field of optical sensing. ALD TiO2 has been widely characterized for its physical and optical properties, but systematic information about the influence of thermal history to optical and mechanical properties of the film is lacking. Optical applications require planar surface and tunability of the refractive index and residual stress. In addition, mechanical properties such as elastic modulus and film hardness influence the performance of the layer, especially, when optics is integrated with microelectromechanical systems. In this work, optical properties, density, elemental analysis, residual stress, elastic modulus and hardness of as-grown ALD TiO2 thin films on silicon were studied at temperature range from 80 to 350 °C and influence of post-ALD thermal annealing was studied on films annealed up to 900 °C. ALD TiO2 films were under tensile stress in the scale of hundreds of MPa. The stress depended both on the ALD temperature and film thickness in a complex way, and onset of crystallization increased the residual stress. Films grown at 110 and 300 °C were able to withstand post-ALD annealing at 420 °C without major change in residual stress, refractive index or extinction coefficient. Elastic modulus and hardness increased upon crystallization with increasing ALD temperature. The results presented here help to improve the design of the optical devices by choosing films with desired optical properties, and further help to design the post-ALD thermal budget so that films maintain their desired features.en
dc.description.versionPeer revieweden
dc.format.extent11
dc.format.mimetypeapplication/pdfen_US
dc.identifier.citationYlivaara, O M E, Langner, A, Liu, X, Schneider, D, Julin, J, Arstila, K, Sintonen, S, Ali, S, Lipsanen, H, Sajavaara, T, Hannula, S-P & Puurunen, R L 2021, ' Mechanical and optical properties of as-grown and thermally annealed titanium dioxide from titanium tetrachloride and water by atomic layer deposition ', Thin Solid Films, vol. 732, 138758 . https://doi.org/10.1016/j.tsf.2021.138758en
dc.identifier.doi10.1016/j.tsf.2021.138758en_US
dc.identifier.issn0040-6090
dc.identifier.issn1879-2731
dc.identifier.otherPURE UUID: df24081c-61f8-43fc-8a13-988f0d061363en_US
dc.identifier.otherPURE ITEMURL: https://research.aalto.fi/en/publications/df24081c-61f8-43fc-8a13-988f0d061363en_US
dc.identifier.otherPURE LINK: http://www.scopus.com/inward/record.url?scp=85107690601&partnerID=8YFLogxKen_US
dc.identifier.otherPURE FILEURL: https://research.aalto.fi/files/65183352/CHEM_Ylivaara_et_al_Mechanical_and_Optical_Properties_2021_Thin_Solid_Films.pdfen_US
dc.identifier.urihttps://aaltodoc.aalto.fi/handle/123456789/108651
dc.identifier.urnURN:NBN:fi:aalto-202107017905
dc.language.isoenen
dc.publisherElsevier Science
dc.relation.ispartofseriesThin Solid Filmsen
dc.relation.ispartofseriesVolume 732en
dc.rightsopenAccessen
dc.subject.keywordALDen_US
dc.subject.keywordAtomic Layer Depositionen_US
dc.subject.keywordelastic modulusen_US
dc.subject.keywordhardnessen_US
dc.subject.keywordoptical propertiesen_US
dc.subject.keywordresidual stressen_US
dc.subject.keywordTiOen_US
dc.titleMechanical and optical properties of as-grown and thermally annealed titanium dioxide from titanium tetrachloride and water by atomic layer depositionen
dc.typeA1 Alkuperäisartikkeli tieteellisessä aikakauslehdessäfi
dc.type.versionpublishedVersion

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