Fabrication of Si nanopillars by reactive ion etching using self-organised masks
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Helsinki University of Technology |
Licentiate thesis
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Date
2003
Department
Major/Subject
Elektronifysiikka
Mcode
S-69
Degree programme
Language
en
Pages
47
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Description
Supervisor
Kuivalainen, PekkaKeywords
nanopillars, nanopilarit, silicon, Pii, self-organised masks, itsejärjestäytyvät maskit, reactive ion etching, reaktiivinen ionietsaus, optical properties, optiset ominaisuudet