Optimization of two-level deep reactive ion etching process

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Journal Title
Journal ISSN
Volume Title
School of Chemical Engineering | Master's thesis
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Date
2010
Major/Subject
Elektroniikan valmistustekniikka
Mcode
S-113
Degree programme
Language
fi
Pages
viii + 84 + [9]
Series
Description
Supervisor
Paulasto-Kröckel, Mervi
Thesis advisor
Savolainen, Kari
Keywords
DRIE, DRIE, 2-level masking, tuplamaskaus, Si residual, piijäämä, Bosch process, Bosch-prosessi
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Citation