Self-erasing and rewritable wettability patterns on ZnO thin films

dc.contributorAalto-yliopistofi
dc.contributorAalto Universityen
dc.contributor.authorKekkonen, Ville
dc.contributor.authorHakola, Antti
dc.contributor.authorKajava, Timo
dc.contributor.authorSahramo, Elina
dc.contributor.authorMalm, Jari
dc.contributor.authorKarppinen, Maarit
dc.contributor.authorRas, Robin H. A.
dc.contributor.departmentKemian laitosfi
dc.contributor.departmentDepartment of Chemistryen
dc.contributor.schoolKemian tekniikan korkeakoulufi
dc.contributor.schoolSchool of Chemical Technologyen
dc.date.accessioned2015-10-08T09:02:07Z
dc.date.available2015-10-08T09:02:07Z
dc.date.issued2010
dc.description.abstractSelf-erasing patterns allow a substrate to be patterned multiple times or could store temporary information for secret communications, and are mostly based on photochromic molecules to change the color of the pattern. Herein we demonstrate self-erasing patterns of wettability on thin ZnO films made by atomic layer deposition. Hydrophilic patterns are written using UV light and decay spontaneously, i.e. become hydrophobic, or are erased aided by vacuum conditions or heat. We demonstrate that these patterns can be applied for channels to confine flow of water without physical walls.en
dc.description.versionPeer revieweden
dc.format.extent044102/1-3
dc.format.mimetypeapplication/pdfen
dc.identifier.citationKekkonen, Ville & Hakola, Antti & Kajava, Timo & Sahramo, Elina & Malm, Jari & Karppinen, Maarit & Ras, Robin H. A.. 2010. Self-erasing and rewritable wettability patterns on ZnO thin films. Applied Physics Letters. Volume 97, Issue 4. 044102/1-3. ISSN 0003-6951 (printed). DOI: 10.1063/1.3460915.en
dc.identifier.doi10.1063/1.3460915
dc.identifier.issn0003-6951 (printed)
dc.identifier.urihttps://aaltodoc.aalto.fi/handle/123456789/18001
dc.identifier.urnURN:NBN:fi:aalto-201510084566
dc.language.isoenen
dc.publisherAIP Publishingen
dc.relation.ispartofseriesApplied Physics Lettersen
dc.relation.ispartofseriesVolume 97, Issue 4
dc.rights© 2010 AIP Publishing. This article may be downloaded for personal use only. Any other use requires prior permission of the authors and the American Institute of Physics. The following article appeared in Applied Physics Letters. Volume 97, Issue 4 and may be found at http://scitation.aip.org/content/aip/journal/apl/97/4/10.1063/1.3460915.en
dc.rights.holderAIP Publishing
dc.subject.keywordzinc oxideen
dc.subject.keywordthin filmsen
dc.subject.keywordphotoinduced wettingen
dc.subject.keywordlasersen
dc.subject.keywordII-VI semiconductorsen
dc.subject.otherChemistryen
dc.subject.otherPhysicsen
dc.titleSelf-erasing and rewritable wettability patterns on ZnO thin filmsen
dc.typeA1 Alkuperäisartikkeli tieteellisessä aikakauslehdessäfi
dc.type.dcmitypetexten
dc.type.versionFinal published versionen
Files
Original bundle
Now showing 1 - 1 of 1
No Thumbnail Available
Name:
A1_kekkonen_ville_2010.pdf
Size:
1016.27 KB
Format:
Adobe Portable Document Format