Nanolaminate structures fabricated by ALD for reducing propagation losses and enhancing the third-order optical nonlinearities

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Journal Title
Journal ISSN
Volume Title
School of Electrical Engineering | A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
Date
2014
Major/Subject
Mcode
Degree programme
Language
en
Pages
898200/1-9
Series
Proc. SPIE 8982, Optical Components and Materials XI, 89820O (March 7, 2014)
Abstract
We demonstrate a novel atomic layer deposition (ALD) process to make high quality nanocrystalline titanium dioxide (TiO2) and zinc oxide (ZnO) with intermediate Al2O3 layers to limit the crystal size. The waveguide losses of TiO2/Al2O3 nanolaminates measured using the prism coupling method for both 633 nm and 1551 nm wavelengths are as low as 0.2 ± 0.1 dB/mm with the smallest crystal size. We also show that the third-order optical nonlinearity in ZnO/Al2O3 nanolaminates can be enhanced by nanoscale engineering of the thin film structure.
Description
Keywords
atomic layer deposition, loss, third-order optical nonlinearity
Other note
Citation
Karvonen, Lasse & Alasaarela, Tapani & Jussila, Henri & Mehravar, Soroush & Chen, Ya & Säynätjoki, Antti & Norwood, Robert A. & Peyghambarian, Nasser & Kieu, Khanh & Honkanen, Seppo & Lipsanen, Harri. 2014. Nanolaminate structures fabricated by ALD for reducing propagation losses and enhancing the third-order optical nonlinearities. Proc. SPIE 8982, Optical Components and Materials XI, 898200 (March 7, 2014). P. 898200/1-9. DOI: 10.1117/12.2045006.