Hybrid inorganic–organic superlattice structures with atomic layer deposition/molecular layer deposition

dc.contributorAalto-yliopistofi
dc.contributorAalto Universityen
dc.contributor.authorTynell, Tommi
dc.contributor.authorYamauchi, Hisao
dc.contributor.authorKarppinen, Maarit
dc.contributor.departmentKemian laitosfi
dc.contributor.departmentDepartment of Chemistryen
dc.contributor.schoolKemian tekniikan korkeakoulufi
dc.contributor.schoolSchool of Chemical Technologyen
dc.date.accessioned2015-10-14T09:01:43Z
dc.date.available2015-10-14T09:01:43Z
dc.date.issued2014
dc.description.abstractA combination of the atomic layer deposition (ALD) and molecular layer deposition (MLD) techniques is successfully employed to fabricate thin films incorporating superlattice structures that consist of single layers of organic molecules between thicker layers of ZnO. Diethyl zinc and water are used as precursors for the deposition of ZnO by ALD, while three different organic precursors are investigated for the MLD part: hydroquinone, 4-aminophenol and 4,4′-oxydianiline. The successful superlattice formation with all the organic precursors is verified through x-ray reflectivity studies. The effects of the interspersed organic layers/superlattice structure on the electrical and thermoelectric properties of ZnO are investigated through resistivity and Seebeck coefficient measurements at room temperature. The results suggest an increase in carrier concentration for small concentrations of organic layers, while higher concentrations seem to lead to rather large reductions in carrier concentration.en
dc.description.versionPeer revieweden
dc.format.extent01A105/1-5
dc.format.mimetypeapplication/pdfen
dc.identifier.citationTynell, Tommi & Yamauchi, Hisao & Karppinen, Maarit. 2014. Hybrid inorganic–organic superlattice structures with atomic layer deposition/molecular layer deposition. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. Volume 32, Issue 1. 01A105/1-5. ISSN 0734-2101 (printed). DOI: 10.1116/1.4831751.en
dc.identifier.doi10.1116/1.4831751
dc.identifier.issn0734-2101 (printed)
dc.identifier.urihttps://aaltodoc.aalto.fi/handle/123456789/18018
dc.identifier.urnURN:NBN:fi:aalto-201510144606
dc.language.isoenen
dc.publisherAmerican Vacuum Societyen
dc.relation.ispartofseriesJournal of Vacuum Science & Technology A: Vacuum, Surfaces, and Filmsen
dc.relation.ispartofseriesVolume 32, Issue 1
dc.rights© 2014 American Vacuum Society. This article may be downloaded for personal use only. Any other use requires prior permission of the authors and the American Institute of Physics. The following article appeared in Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. Volume 32, Issue 1 and may be found at http://scitation.aip.org/content/avs/journal/jvsta/32/1/10.1116/1.4831751.en
dc.rights.holderAmerican Vacuum Society
dc.subject.keywordzinc oxideen
dc.subject.keywordthin filmsen
dc.subject.keywordsuperlatticesen
dc.subject.keywordsuperconductorsen
dc.subject.otherChemistryen
dc.titleHybrid inorganic–organic superlattice structures with atomic layer deposition/molecular layer depositionen
dc.typeA1 Alkuperäisartikkeli tieteellisessä aikakauslehdessäfi
dc.type.dcmitypetexten
dc.type.versionFinal published versionen
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