Hybrid inorganic–organic superlattice structures with atomic layer deposition/molecular layer deposition
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© 2014 American Vacuum Society. This article may be downloaded for personal use only. Any other use requires prior permission of the authors and the American Institute of Physics. The following article appeared in Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. Volume 32, Issue 1 and may be found at http://scitation.aip.org/content/avs/journal/jvsta/32/1/10.1116/1.4831751.
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School of Chemical Technology |
A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
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Date
2014
Department
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Mcode
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Language
en
Pages
01A105/1-5
Series
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Volume 32, Issue 1
Abstract
A combination of the atomic layer deposition (ALD) and molecular layer deposition (MLD) techniques is successfully employed to fabricate thin films incorporating superlattice structures that consist of single layers of organic molecules between thicker layers of ZnO. Diethyl zinc and water are used as precursors for the deposition of ZnO by ALD, while three different organic precursors are investigated for the MLD part: hydroquinone, 4-aminophenol and 4,4′-oxydianiline. The successful superlattice formation with all the organic precursors is verified through x-ray reflectivity studies. The effects of the interspersed organic layers/superlattice structure on the electrical and thermoelectric properties of ZnO are investigated through resistivity and Seebeck coefficient measurements at room temperature. The results suggest an increase in carrier concentration for small concentrations of organic layers, while higher concentrations seem to lead to rather large reductions in carrier concentration.Description
Keywords
zinc oxide, thin films, superlattices, superconductors
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Citation
Tynell, Tommi & Yamauchi, Hisao & Karppinen, Maarit. 2014. Hybrid inorganic–organic superlattice structures with atomic layer deposition/molecular layer deposition. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. Volume 32, Issue 1. 01A105/1-5. ISSN 0734-2101 (printed). DOI: 10.1116/1.4831751.
