Enhancement of thermoelectric power of PbTe thin films by Ag ion implantation

dc.contributorAalto-yliopistofi
dc.contributorAalto Universityen
dc.contributor.authorBala, Manju
dc.contributor.authorBhogra, Anuradha
dc.contributor.authorKhan, Saif A
dc.contributor.authorTripathi, Tripurari S.
dc.contributor.authorTripathi, Surya K.
dc.contributor.authorAvasthi, Devesh K.
dc.contributor.authorAsokan, Kandasami
dc.contributor.departmentDepartment of Chemistry and Materials Scienceen
dc.contributor.groupauthorInorganic Materials Chemistryen
dc.contributor.organizationInter University Accelerator Centre India
dc.contributor.organizationPanjab University
dc.contributor.organizationAmity University
dc.date.accessioned2018-08-01T13:37:28Z
dc.date.available2018-08-01T13:37:28Z
dc.date.issued2017-06-07
dc.description.abstractEnhancement of the figure of merit (ZT) of thermoelectric materials is the topic of current research in energy studies. We report an enhancement in the thermoelectric power (TEP) of thermally evaporated PbTe thin films by low energy Ag ion implantation. This implantation results in PbTe:Ag nanocomposites. Implantations were carried out at a 130 keV Ag ion beam with ion fluences of 3 × 1015, 1.5 × 1016, 3 × 1016, and 4.5 × 1016 ions/cm2. The atomic concentrations were determined using Rutherford backscattering and found to be 1 at. %, 5 at. %, 10 at. %, and 14 at. % in the implanted PbTe films. Scanning electron microscopy images show the presence of fine cracks on the surface of as-deposited PbTe thin films that get shortened and suppressed and finally disappear at higher fluences of Ag ion implantation. The TEP measurements, from 300 K to 400 K, show ∼25% enhancement in the Seebeck coefficient of the Ag ion implanted films in comparison to the pristine PbTe thin film. The synchrotron based high resolution X-ray diffraction and X-ray photoelectron spectroscopy investigations reveal the formation of Ag2Te in the surface layer after Ag ion implantation.en
dc.description.versionPeer revieweden
dc.format.extent9
dc.format.mimetypeapplication/pdf
dc.identifier.citationBala, M, Bhogra, A, Khan, S A, Tripathi, T S, Tripathi, S K, Avasthi, D K & Asokan, K 2017, 'Enhancement of thermoelectric power of PbTe thin films by Ag ion implantation', Journal of Applied Physics, vol. 121, no. 21, 215301. https://doi.org/10.1063/1.4984050en
dc.identifier.doi10.1063/1.4984050
dc.identifier.issn0021-8979
dc.identifier.issn1089-7550
dc.identifier.otherPURE UUID: fd8521d4-64fb-4098-9e96-b272b9320efb
dc.identifier.otherPURE ITEMURL: https://research.aalto.fi/en/publications/fd8521d4-64fb-4098-9e96-b272b9320efb
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dc.identifier.otherPURE FILEURL: https://research.aalto.fi/files/26524193/1.4984050.pdf
dc.identifier.urihttps://aaltodoc.aalto.fi/handle/123456789/32977
dc.identifier.urnURN:NBN:fi:aalto-201808014378
dc.language.isoenen
dc.publisherAmerican Institute of Physics
dc.relation.ispartofseriesJournal of Applied Physicsen
dc.relation.ispartofseriesVolume 121, issue 21en
dc.rightsopenAccessen
dc.titleEnhancement of thermoelectric power of PbTe thin films by Ag ion implantationen
dc.typeA1 Alkuperäisartikkeli tieteellisessä aikakauslehdessäfi
dc.type.versionpublishedVersion

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