A study of N-polar aluminum nitride thin films on silicon carbide substrates

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Journal Title
Journal ISSN
Volume Title
Sähkötekniikan korkeakoulu | Master's thesis
Author
Date
2019-03-11
Department
Major/Subject
Micro- and Nanosciences
Mcode
ELEC3037
Degree programme
NanoRad - Master’s Programme in Nano and Radio Sciences (TS2013)
Language
en
Pages
6+76
Series
Description
Supervisor
Sopanen, Markku
Thesis advisor
Suihkonen, Sami
Keywords
aluminum nitride, MOCVD, silicon carbide, III-Ns on SiC
Other note
Citation
Permanent link to this item
https://urn.fi/URN:NBN:fi:aalto-201903172341
Collections
[dipl] Sähkötekniikan korkeakoulu / ELEC