A study of N-polar aluminum nitride thin films on silicon carbide substrates
No Thumbnail Available
URL
Journal Title
Journal ISSN
Volume Title
Sähkötekniikan korkeakoulu |
Master's thesis
Authors
Date
2019-03-11
Department
Major/Subject
Micro- and Nanosciences
Mcode
ELEC3037
Degree programme
NanoRad - Master’s Programme in Nano and Radio Sciences (TS2013)
Language
en
Pages
6+76
Series
Description
Supervisor
Sopanen, MarkkuThesis advisor
Suihkonen, SamiKeywords
aluminum nitride, MOCVD, silicon carbide, III-Ns on SiC