Mixed-Anion Compounds: An Unexplored Playground for ALD Fabrication

dc.contributorAalto-yliopistofi
dc.contributorAalto Universityen
dc.contributor.authorTripathi, Tripurari Sharanen_US
dc.contributor.authorKarppinen, Maariten_US
dc.contributor.departmentDepartment of Chemistry and Materials Scienceen
dc.contributor.groupauthorInorganic Materials Chemistryen
dc.date.accessioned2021-07-01T13:07:08Z
dc.date.available2021-07-01T13:07:08Z
dc.date.issued2021-06-09en_US
dc.descriptionPublisher Copyright: © 2021 Wiley-VCH GmbH Copyright: Copyright 2021 Elsevier B.V., All rights reserved.
dc.description.abstractFor decades the most successful approach towards new inorganic material innovations for next-generation devices has been to manipulate the cation composition. As this cation-centric material development is inevitably approaching its saturation, new chemistries are needed to maintain the pace of technological progress. One of the new chemistry approaches is to play with the anions instead of the cations. Moreover, advances in fabrication techniques are needed to address the endeavors to shrink the device and component dimensions. Here, the combination of mixed-anion chemistries, such as oxychalcogenides or carbopnictides, and the state-of-the-art atomic layer deposition (ALD) thin-film technology are highlighted. The unique bottom-up material building mode of ALD can lead to scientifically exciting but at the same time industry-feasible material innovations. In this brief review, the present status and prospects, and the challenges of this emerging field are discussed.en
dc.description.versionPeer revieweden
dc.format.extent14
dc.format.mimetypeapplication/pdfen_US
dc.identifier.citationTripathi, T S & Karppinen, M 2021, ' Mixed-Anion Compounds : An Unexplored Playground for ALD Fabrication ', Advanced Materials Interfaces, vol. 8, no. 11, 2100146 . https://doi.org/10.1002/admi.202100146en
dc.identifier.doi10.1002/admi.202100146en_US
dc.identifier.issn2196-7350
dc.identifier.otherPURE UUID: 6248bcc4-4991-403c-86b2-c2a6704a1729en_US
dc.identifier.otherPURE ITEMURL: https://research.aalto.fi/en/publications/6248bcc4-4991-403c-86b2-c2a6704a1729en_US
dc.identifier.otherPURE LINK: http://www.scopus.com/inward/record.url?scp=85105195092&partnerID=8YFLogxKen_US
dc.identifier.otherPURE FILEURL: https://research.aalto.fi/files/65163351/CHEM_Tripathi_et_al_Mixed_Anion_Compounds_2021_Advanced_Materials_Interfaces.pdfen_US
dc.identifier.urihttps://aaltodoc.aalto.fi/handle/123456789/108606
dc.identifier.urnURN:NBN:fi:aalto-202107017860
dc.language.isoenen
dc.publisherWILEY-BLACKWELL
dc.relation.ispartofseriesAdvanced Materials Interfacesen
dc.relation.ispartofseriesVolume 8, issue 11en
dc.rightsopenAccessen
dc.subject.keywordatomic layer depositionen_US
dc.subject.keywordcarbonitrideen_US
dc.subject.keywordmixed-anion compounden_US
dc.subject.keywordoxyhalideen_US
dc.subject.keywordoxypnictideen_US
dc.subject.keywordoxysulfideen_US
dc.subject.keywordthin-film technologyen_US
dc.titleMixed-Anion Compounds: An Unexplored Playground for ALD Fabricationen
dc.typeA2 Katsausartikkeli tieteellisessä aikakauslehdessäfi
dc.type.versionpublishedVersion
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