Atomic/Molecular Layer Deposition for Designer's Functional Metal–Organic Materials

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Journal Title
Journal ISSN
Volume Title
A2 Katsausartikkeli tieteellisessä aikakauslehdessä
Date
2022-05-23
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Mcode
Degree programme
Language
en
Pages
Series
Advanced Materials Interfaces, articlenumber 2200210
Abstract
Atomic layer deposition (ALD) for high-quality conformal inorganic thin films is one of the cornerstones of modern microelectronics, while molecular layer deposition (MLD) is its less-exploited counterpart for purely organic thin films. Currently, the hybrid of these two techniques, i.e., ALD/MLD, is strongly emerging as a state-of-the-art gas-phase route for designer's metal–organic thin films, e.g., for the next-generation energy technologies. The ALD/MLD literature comprises nearly 300 original journal papers covering most of the alkali and alkaline earth metals, 3d transition metals, and lanthanides as the metal component and a variety of aliphatic, aromatic, and natural organic components. Some of these ALD/MLD processes yield in situ crystalline coordination-polymer- or metal–organic-framework-like structures. Another attractive aspect is that many of the metal–organics realized through ALD/MLD are fundamentally new materials, and even unaccessible through conventional synthesis. Here, the current stateof research in the field is presented, by i) providing a comprehensive account of the ALD/MLD processes so far developed, ii) addressing the constraints/possibilities for growing in situ crystalline metal–organic films, iii) highlighting some intriguing ALD/MLD materials and their application potential, and iv) making a brief outlook to the future perspectives and challenges in the field.
Description
| openaire: EC/FP7/339478/EU//LAYERENG-HYBMAT Funding Information: This work has received funding from the European Research Council under the European Union's Seventh Framework Programme (FP/2007‐2013)/ERC Advanced Grant Agreement (No. 339478) and also from the Academy of Finland (Profi3, PREIN). Publisher Copyright: © 2022 The Authors. Advanced Materials Interfaces published by Wiley-VCH GmbH.
Keywords
atomic layer deposition/molecular layer deposition (ALD/MLD), crystalline metal–organic thin films, metal–organic materials
Other note
Citation
Multia , J & Karppinen , M 2022 , ' Atomic/Molecular Layer Deposition for Designer's Functional Metal–Organic Materials ' , Advanced Materials Interfaces , vol. 9 , no. 15 , 2200210 . https://doi.org/10.1002/admi.202200210