Spatial uniformity of black silicon induced junction photodiode responsivity
| dc.contributor | Aalto-yliopisto | fi |
| dc.contributor | Aalto University | en |
| dc.contributor.author | Heinonen, Juha | en_US |
| dc.contributor.author | Haarahiltunen, Antti | en_US |
| dc.contributor.author | Vähänissi, Ville | en_US |
| dc.contributor.author | Pasanen, Toni P. | en_US |
| dc.contributor.author | Savin, Hele | en_US |
| dc.contributor.author | Toivanen, Juha | en_US |
| dc.contributor.author | Juntunen, Mikko A. | en_US |
| dc.contributor.department | Department of Electronics and Nanoengineering | en |
| dc.contributor.editor | Jiang, Shibin | en_US |
| dc.contributor.editor | Digonnet, Michel J. | en_US |
| dc.contributor.groupauthor | Hele Savin Group | en |
| dc.date.accessioned | 2023-04-19T06:06:36Z | |
| dc.date.available | 2023-04-19T06:06:36Z | |
| dc.date.issued | 2023-03-14 | en_US |
| dc.description.abstract | Black silicon induced junction photodiodes have nearly ideal responsivity across a wide range of wavelengths between 175-1100 nm, with external quantum efficiency over 99 % at visible wavelengths, when a single spot is measured using light beam between 1 to 2mm in diameter. The spatial uniformity of responsivity is also an important characteristic of a high-quality photodiode, when considering its usage as a reference in photometry. We study here the spatial uniformity of responsivity of large area (8mmx8mm) black silicon photodiodes at 405 nm wavelength. Our results show that the spatial non-uniformity is less than 0.5 % over 90 % of the surface area, and thus the photodiodes meet the thigh criteria typically set for reference standards and are hence suitable for such application. | en |
| dc.description.version | Peer reviewed | en |
| dc.format.extent | 7 | |
| dc.format.mimetype | application/pdf | en_US |
| dc.identifier.citation | Heinonen, J, Haarahiltunen, A, Vähänissi, V, Pasanen, T P, Savin, H, Toivanen, J & Juntunen, M A 2023, Spatial uniformity of black silicon induced junction photodiode responsivity. in S Jiang & M J Digonnet (eds), Optical Components and Materials XX., 1241713, Proceedings of SPIE : the International Society for Optical Engineering, SPIE, Optical Components and Materials, San Francisco, California, United States, 28/01/2023. https://doi.org/10.1117/12.2649636 | en |
| dc.identifier.doi | 10.1117/12.2649636 | en_US |
| dc.identifier.isbn | 978-1-5106-5939-1 | |
| dc.identifier.isbn | 978-1-5106-5940-7 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.issn | 1996-756X | |
| dc.identifier.other | PURE UUID: a5136b4e-54c4-4b81-9f1f-ced26ecada75 | en_US |
| dc.identifier.other | PURE ITEMURL: https://research.aalto.fi/en/publications/a5136b4e-54c4-4b81-9f1f-ced26ecada75 | en_US |
| dc.identifier.other | PURE FILEURL: https://research.aalto.fi/files/133843458/1241713.pdf | |
| dc.identifier.uri | https://aaltodoc.aalto.fi/handle/123456789/120473 | |
| dc.identifier.urn | URN:NBN:fi:aalto-202304192789 | |
| dc.language.iso | en | en |
| dc.relation.ispartof | Optical Components and Materials | en |
| dc.relation.ispartofseries | Optical Components and Materials XX | en |
| dc.relation.ispartofseries | Proceedings of SPIE : the International Society for Optical Engineering | en |
| dc.rights | openAccess | en |
| dc.subject.keyword | Black silicon | en_US |
| dc.subject.keyword | spatial uniformity | en_US |
| dc.subject.keyword | silicon | en_US |
| dc.subject.keyword | photodiode | en_US |
| dc.title | Spatial uniformity of black silicon induced junction photodiode responsivity | en |
| dc.type | A4 Artikkeli konferenssijulkaisussa | fi |
| dc.type.version | publishedVersion |