Spatial uniformity of black silicon induced junction photodiode responsivity

dc.contributorAalto-yliopistofi
dc.contributorAalto Universityen
dc.contributor.authorHeinonen, Juhaen_US
dc.contributor.authorHaarahiltunen, Anttien_US
dc.contributor.authorVähänissi, Villeen_US
dc.contributor.authorPasanen, Toni P.en_US
dc.contributor.authorSavin, Heleen_US
dc.contributor.authorToivanen, Juhaen_US
dc.contributor.authorJuntunen, Mikko A.en_US
dc.contributor.departmentDepartment of Electronics and Nanoengineeringen
dc.contributor.editorJiang, Shibinen_US
dc.contributor.editorDigonnet, Michel J.en_US
dc.contributor.groupauthorHele Savin Groupen
dc.date.accessioned2023-04-19T06:06:36Z
dc.date.available2023-04-19T06:06:36Z
dc.date.issued2023-03-14en_US
dc.description.abstractBlack silicon induced junction photodiodes have nearly ideal responsivity across a wide range of wavelengths between 175-1100 nm, with external quantum efficiency over 99 % at visible wavelengths, when a single spot is measured using light beam between 1 to 2mm in diameter. The spatial uniformity of responsivity is also an important characteristic of a high-quality photodiode, when considering its usage as a reference in photometry. We study here the spatial uniformity of responsivity of large area (8mmx8mm) black silicon photodiodes at 405 nm wavelength. Our results show that the spatial non-uniformity is less than 0.5 % over 90 % of the surface area, and thus the photodiodes meet the thigh criteria typically set for reference standards and are hence suitable for such application.en
dc.description.versionPeer revieweden
dc.format.extent7
dc.format.mimetypeapplication/pdfen_US
dc.identifier.citationHeinonen, J, Haarahiltunen, A, Vähänissi, V, Pasanen, T P, Savin, H, Toivanen, J & Juntunen, M A 2023, Spatial uniformity of black silicon induced junction photodiode responsivity. in S Jiang & M J Digonnet (eds), Optical Components and Materials XX., 1241713, Proceedings of SPIE : the International Society for Optical Engineering, SPIE, Optical Components and Materials, San Francisco, California, United States, 28/01/2023. https://doi.org/10.1117/12.2649636en
dc.identifier.doi10.1117/12.2649636en_US
dc.identifier.isbn978-1-5106-5939-1
dc.identifier.isbn978-1-5106-5940-7
dc.identifier.issn0277-786X
dc.identifier.issn1996-756X
dc.identifier.otherPURE UUID: a5136b4e-54c4-4b81-9f1f-ced26ecada75en_US
dc.identifier.otherPURE ITEMURL: https://research.aalto.fi/en/publications/a5136b4e-54c4-4b81-9f1f-ced26ecada75en_US
dc.identifier.otherPURE FILEURL: https://research.aalto.fi/files/133843458/1241713.pdf
dc.identifier.urihttps://aaltodoc.aalto.fi/handle/123456789/120473
dc.identifier.urnURN:NBN:fi:aalto-202304192789
dc.language.isoenen
dc.relation.ispartofOptical Components and Materialsen
dc.relation.ispartofseriesOptical Components and Materials XXen
dc.relation.ispartofseriesProceedings of SPIE : the International Society for Optical Engineeringen
dc.rightsopenAccessen
dc.subject.keywordBlack siliconen_US
dc.subject.keywordspatial uniformityen_US
dc.subject.keywordsiliconen_US
dc.subject.keywordphotodiodeen_US
dc.titleSpatial uniformity of black silicon induced junction photodiode responsivityen
dc.typeA4 Artikkeli konferenssijulkaisussafi
dc.type.versionpublishedVersion

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