Atomic layer deposition of Zr-sandwiched ZnO thin films for transparent thermoelectrics

dc.contributorAalto-yliopistofi
dc.contributorAalto Universityen
dc.contributor.authorKoskinen, Tomien_US
dc.contributor.authorVolin, Ulrikaen_US
dc.contributor.authorTossi, Camillaen_US
dc.contributor.authorRaju, Rameshen_US
dc.contributor.authorTittonen, Ilkkaen_US
dc.contributor.departmentDepartment of Electronics and Nanoengineeringen
dc.contributor.groupauthorIlkka Tittonen Groupen
dc.contributor.organizationDepartment of Electronics and Nanoengineeringen_US
dc.date.accessioned2022-11-30T08:35:44Z
dc.date.available2022-11-30T08:35:44Z
dc.date.issued2023-01-15en_US
dc.descriptionFunding Information: The authors acknowledge the financial support from the Academy of Finland projects 319018 eVapor and 329406 CarbonSurf as well as from the Photonics Flagship PREIN. T.K. acknowledges the doctoral school of Aalto University School of Electrical Engineering, Walter Ahlström foundation and Waldemar Von Frenckell foundation for financial support. C.T. acknowledges the financial support of the Yrjö, Vilho ja Kalle Väisälä Fund and of the Finnish Academy of Sciences and Letters. The experimental work was carried out in Micronova, the nanofabrication facility of Aalto University. Edgar Maiorov is acknowledged for ALD equipment support. Dr Vladimir Kornienko is acknowledged for helping with the transmission measurement. The characterization by XRD, TEM and FIB was carried out in the Nanomicroscopy Center of Aalto University. Funding Information: The authors acknowledge the financial support from the Academy of Finland projects 319018 eVapor and 329406 CarbonSurf as well as from the Photonics Flagship PREIN. T.K. acknowledges the doctoral school of Aalto University School of Electrical Engineering, Walter Ahlström foundation and Waldemar Von Frenckell foundation for financial support. C.T. acknowledges the financial support of the Yrjö, Vilho ja Kalle Väisälä Fund and of the Finnish Academy of Sciences and Letters. The experimental work was carried out in Micronova, the nanofabrication facility of Aalto University. Edgar Maiorov is acknowledged for ALD equipment support. Dr Vladimir Kornienko is acknowledged for helping with the transmission measurement. The characterization by XRD, TEM and FIB was carried out in the Nanomicroscopy Center of Aalto University. Publisher Copyright: © 2022 The Author(s). Published by IOP Publishing Ltd.
dc.description.abstractAtomic layer deposited (ALD) transparent thermoelectric materials enable the introduction of energy harvesting and sensing devices onto surfaces of various shapes and sizes in imperceptible manner. Amongst these materials, ZnO has shown promising results in terms of both thermoelectric and optical characteristics. The thermoelectric performance of ZnO can be further optimized by introducing extrinsic doping, to the realization of which ALD provides excellent control. Here, we explore the effects of sandwiching of ZrO2 layers with ZnO on glass substrates. The room-temperature thermoelectric power factor is maximised at 116μW m−1 K−2 with samples containing a 2% nominal percentage of ZrO2. The addition of ZrO2 layers is further shown to reduce the thermal conductivity, resulting in a 20.2% decrease from the undoped ZnO at 2% doping. Our results contribute to increasing the understanding of the effects of Zr inclusion in structural properties and growth of ALD ZnO, as well as the thermal and thermoelectric properties of Zr-doped ZnO films in general.en
dc.description.versionPeer revieweden
dc.format.mimetypeapplication/pdfen_US
dc.identifier.citationKoskinen, T, Volin, U, Tossi, C, Raju, R & Tittonen, I 2023, ' Atomic layer deposition of Zr-sandwiched ZnO thin films for transparent thermoelectrics ', Nanotechnology, vol. 34, no. 3, 035401 . https://doi.org/10.1088/1361-6528/ac9980en
dc.identifier.doi10.1088/1361-6528/ac9980en_US
dc.identifier.issn0957-4484
dc.identifier.issn1361-6528
dc.identifier.otherPURE UUID: 4e40a3d3-f83d-4510-b977-13efbc3eff5fen_US
dc.identifier.otherPURE ITEMURL: https://research.aalto.fi/en/publications/4e40a3d3-f83d-4510-b977-13efbc3eff5fen_US
dc.identifier.otherPURE LINK: http://www.scopus.com/inward/record.url?scp=85141890032&partnerID=8YFLogxK
dc.identifier.otherPURE FILEURL: https://research.aalto.fi/files/93399482/Koskinen_2023_Nanotechnology_34_035401.pdfen_US
dc.identifier.urihttps://aaltodoc.aalto.fi/handle/123456789/117933
dc.identifier.urnURN:NBN:fi:aalto-202211306689
dc.language.isoenen
dc.publisherInstitute of Physics Publishing
dc.relation.ispartofseriesNanotechnologyen
dc.relation.ispartofseriesVolume 34, issue 3en
dc.rightsopenAccessen
dc.subject.keywordatomic layer depositionen_US
dc.subject.keywordthermoelectricen_US
dc.subject.keywordtransparenten_US
dc.subject.keywordzinc oxideen_US
dc.subject.keywordzirconiumen_US
dc.titleAtomic layer deposition of Zr-sandwiched ZnO thin films for transparent thermoelectricsen
dc.typeA1 Alkuperäisartikkeli tieteellisessä aikakauslehdessäfi
dc.type.versionpublishedVersion

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