Block Copolymer Approach toward Selective Atomic-Layer Deposition of ZnO Films
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A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
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Date
2024-02
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en
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Advanced Engineering Materials, articlenumber 2300937
Abstract
High-quality thin films of ZnO fabricated with atomic-layer precision are attracting increasing interest in various applications beyond the conventional semiconductor industry. This has posed new demands for these thin films regarding, for example, the substrate compatibility and substrate-selective deposition. Herein, the impact of different underlining polymer substrates on the film growth characteristics of ZnO coatings fabricated with the atomic-layer deposition (ALD) technique is investigated. The resultant thin films are systematically characterized for the growth rate, crystallinity, surface morphology, hydrophilicity, and electrical conductivity. Most excitingly, based on the understanding gained for the ZnO film growth on the different homopolymer surfaces, nanoscale-patterned block copolymer (BCP) films via spin coating are designed and fabricated to demonstrate block-selective ALD of ZnO on these BCP surfaces. It will be shown that the polyethylene oxide parts of the BCP act as a significantly more passive surface for the ZnO growth than the polystyrene. Altogether, this concept couples two highly controllable methods—atomic-level precision of ALD and nanoscale precision of BCP substrates—into a simple and scalable way of producing diverse nanomaterial patterns.Description
| openaire: EC/H2020/949648/EU//ModelCom | openaire: EC/HE/101097815/EU//UniEn-MLD Funding Information: A.P. and Y.D. contributed equally to this work. Funding was received through the Academy of Finland SUPER‐WEAR project (decision number: 322214), and the European Research Council (H2020) StG “Autonomously adapting and communicating modular textiles” (grant no. 949648) and AdG “Unique ALD/MLD‐enabled material functions” (grant no. 101097815). The authors also acknowledge the use of the RawMatTERS Finland Infrastructure (RAMI) at Aalto University. Publisher Copyright: © 2023 The Authors. Advanced Engineering Materials published by Wiley-VCH GmbH.
Keywords
area-selective atomic-layer deposition, block copolymers, coatings, low-temperature ALD, zinc oxide
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Philip, A, Dong, Y, Vapaavuori, J & Karppinen, M 2024, ' Block Copolymer Approach toward Selective Atomic-Layer Deposition of ZnO Films ', Advanced Engineering Materials, vol. 26, no. 4, 2300937 . https://doi.org/10.1002/adem.202300937