Upscaling of a ruthenium atomic layer deposition process using a zero-valent precursor
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URL
Journal Title
Journal ISSN
Volume Title
Kemian tekniikan korkeakoulu |
Master's thesis
Authors
Date
2021-08-23
Department
Major/Subject
Industrial Energy Processes and Sustainability
Mcode
CHEM3044
Degree programme
Master’s Programme in Advanced Energy solutions (AAE)
Language
en
Pages
65 + 4
Series
Description
Supervisor
Puurunen, RiikkaThesis advisor
King, PeterHämäläinen, Jani
Keywords
atomic layer deposition, ruthenium, zero-valent precursor, uniformity, resistivity