Application of ultra-thin aluminum oxide etch mask made by atomic layer deposition technique
Loading...
Access rights
openAccess
publishedVersion
URL
Journal Title
Journal ISSN
Volume Title
A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
This publication is imported from Aalto University research portal.
View publication in the Research portal (opens in new window)
View/Open full text file from the Research portal (opens in new window)
View publication in the Research portal (opens in new window)
View/Open full text file from the Research portal (opens in new window)
Date
2007
Major/Subject
Mcode
Degree programme
Language
en
Pages
Series
Journal of Physics: Conference Series, Volume 61, pp. 369-373
Description
Keywords
Other note
Citation
Grigoras, K, Sainiemi, L, Tiilikainen, J, Säynätjoki, A, Airaksinen, V-M & Franssila, S 2007, ' Application of ultra-thin aluminum oxide etch mask made by atomic layer deposition technique ', Journal of Physics: Conference Series, vol. 61, pp. 369-373 . https://doi.org/10.1088/1742-6596/61/1/074