Transparent ferrimagnetic semiconducting CuCr2O4 thin films by atomic layer deposition
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A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
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2016-04-01
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en
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APL MATERIALS, Volume 4, issue 4
Abstract
We report the magnetic and optical properties of CuCr2O4 thin films fabricated by atomic layer deposition (ALD) from Cu(thd)2, Cr(acac)3, and ozone; we deposit 200 nm thick films and anneal them at 700 °C in oxygen atmosphere to crystallize the spinel phase. A ferrimagnetic transition at 140 K and a direct bandgap of 1.36 eV are determined for the films from magnetic and UV-vis spectrophotometric measurements. Electrical transport measurements confirm the p-type semiconducting behavior of the films. As the ALD technique allows the deposition of conformal pin-hole-free coatings on complex 3D surfaces, our CuCr2O4 films are interesting material candidates for various frontier applications.Description
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Tripathi, T S, Yadav, C S & Karppinen, M 2016, ' Transparent ferrimagnetic semiconducting CuCr 2 O 4 thin films by atomic layer deposition ', APL Materials, vol. 4, no. 4, 046106 . https://doi.org/10.1063/1.4946884