Deposition of aluminium, hafnium and zirkonium oxide thin films for gate oxide applications
dc.contributor | Aalto-yliopisto | fi |
dc.contributor | Aalto University | en |
dc.contributor.advisor | Tuominen, Marko | |
dc.contributor.author | Laitinen, Otto | |
dc.contributor.department | Kemian tekniikan osasto | fi |
dc.contributor.school | Teknillinen korkeakoulu | fi |
dc.contributor.school | Helsinki University of Technology | en |
dc.contributor.supervisor | Niinistö, Lauri | |
dc.date.accessioned | 2020-12-04T15:10:48Z | |
dc.date.available | 2020-12-04T15:10:48Z | |
dc.date.issued | 2002 | |
dc.format.extent | viii + 102 s. + liitt. 8 | |
dc.identifier.uri | https://aaltodoc.aalto.fi/handle/123456789/90044 | |
dc.identifier.urn | URN:NBN:fi:aalto-2020120448879 | |
dc.language.iso | fi | en |
dc.programme.major | Epäorgaaninen kemia | fi |
dc.programme.mcode | Kem-35 | fi |
dc.rights.accesslevel | closedAccess | |
dc.title | Deposition of aluminium, hafnium and zirkonium oxide thin films for gate oxide applications | en |
dc.title | Alumiini-, hafnium- ja zirkoniumoksidiohutkalvojen valmistus hilaoksidisovelluksiin | fi |
dc.type.okm | G2 Pro gradu, diplomityö | |
dc.type.ontasot | Master's thesis | en |
dc.type.ontasot | Pro gradu -tutkielma | fi |
dc.type.publication | masterThesis | |
local.aalto.digiauth | ask | |
local.aalto.digifolder | Aalto_16371 | |
local.aalto.idinssi | 18899 | |
local.aalto.openaccess | no |