Crossover between Electron-Phonon and Boundary-Resistance Limits to Thermal Relaxation in Copper Films

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A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
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Date
2019-08-23
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Mcode
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Language
en
Pages
6
1-6
Series
Physical Review Applied, Volume 12, issue 2
Abstract
We observe a crossover fromelectron-phonon (e-ph) coupling limited energy relaxation to that governed by thermal boundary resistance (phonon-phonon coupling, ph-ph) in copper films at subkelvin temperatures. Our measurement yields a quantitative picture of heat currents, in terms of temperature dependences and magnitudes, in both e-ph and pp limited regimes, respectively. We show that by adding a third layer in between the copper film and the substrate, the thermal boundary resistance is increased fourfold, consistent with an assumed series connection of thermal resistances.
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| openaire: EC/H2020/742559/EU//SQH
Keywords
HEAT-CONDUCTION, HOT-ELECTRONS, QUANTUM, MULTILAYERS
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Citation
Wang , L B , Saira , O-P , Golubev , D S & Pekola , J P 2019 , ' Crossover between Electron-Phonon and Boundary-Resistance Limits to Thermal Relaxation in Copper Films ' , Physical Review Applied , vol. 12 , no. 2 , 024051 , pp. 1-6 . https://doi.org/10.1103/PhysRevApplied.12.024051