Characterization of thin film resistor sputtered with two different chromium silicide targets

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dc.contributorAalto-yliopistofi
dc.contributorAalto Universityen
dc.contributor.advisorVirolainen, Ulla 
dc.contributor.advisorHaimi, Eero 
dc.contributor.authorKoivisto, Outi
dc.contributor.departmentMateriaali- ja kalliotekniikan osastofi
dc.contributor.schoolTeknillinen korkeakoulufi
dc.contributor.schoolHelsinki University of Technologyen
dc.contributor.supervisorLindroos, Veikko 
dc.date.accessioned2020-12-04T15:10:07Z
dc.date.available2020-12-04T15:10:07Z
dc.date.issued2002 
dc.format.extent61 
dc.identifier.urihttps://aaltodoc.aalto.fi/handle/123456789/90031
dc.identifier.urnURN:NBN:fi:aalto-2020120448866
dc.language.isoenen
dc.programme.majorMetalli- ja materiaalioppifi
dc.programme.mcodeMak-45fi
dc.rights.accesslevelclosedAccess
dc.subject.keywordchromium silicideen
dc.subject.keywordkromisilisidifi
dc.subject.keywordsputteringen
dc.subject.keywordsputterointifi
dc.subject.keywordthin film resistoren
dc.subject.keywordohutkalvovastusfi
dc.titleCharacterization of thin film resistor sputtered with two different chromium silicide targetsen
dc.titleKahdella eri kromisilisiditargetilla sputteroitujen ohutkalvovastusten karakterisointifi
dc.type.okmG2 Pro gradu, diplomityö 
dc.type.ontasotMaster's thesisen
dc.type.ontasotPro gradu -tutkielmafi
dc.type.publicationmasterThesis 
local.aalto.digiauthask
local.aalto.digifolderAalto_40149
local.aalto.idinssi18854
local.aalto.openaccessno

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