Chromium silicide based thin film resistor plasma etch process characterization and post-etch residue analysis
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Helsinki University of Technology |
Master's thesis
Checking the digitized thesis and permission for publishing
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Instructions for the author
Location:
P1 Ark S80
P1 Ark S80
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Mcode
S-113
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Language
en
Pages
x + 89 s. + liitt. 5
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Description
Supervisor
Kivilahti, JormaThesis advisor
Lämsä, ErjaLaurila, Tomi