Chromium silicide based thin film resistor plasma etch process characterization and post-etch residue analysis
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Helsinki University of Technology |
Diplomityö
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Instructions for the author
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Date
2007
Department
Major/Subject
Elektroniikan valmistustekniikka
Mcode
S-113
Degree programme
Language
en
Pages
x + 89 s. + liitt. 5
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Description
Supervisor
Kivilahti, JormaThesis advisor
Lämsä, ErjaLaurila, Tomi
Keywords
plasma etching, plasmaetsaus, characterization, karakterisointi, thin film resistor, ohutkalvovastus, resist removal, resistinpoisto