Effect of substrate pretreatments on the atomic layer deposited Al2O3 passivation quality

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Volume Title
A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
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Author
Date
2015
Department
Hele Savin Group
Department of Micro and Nanosciences
Major/Subject
Mcode
Degree programme
Language
en
Pages
4
Series
JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A, Volume 33, issue 1
Description
VK: T40310
Keywords
DOI
10.1116/1.4901456
Citation
Bao , Y , Li , S , von Gastrow , G , Repo , P , Putkonen , M & Savin , H 2015 , ' Effect of substrate pretreatments on the atomic layer deposited Al2O3 passivation quality ' , Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films , vol. 33 , no. 1 , 01A123 . https://doi.org/10.1116/1.4901456
Permanent link to this item
https://urn.fi/URN:NBN:fi:aalto-201808014106
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[article-cris] Sähkötekniikan korkeakoulu / ELEC