aalto1 untyped-item.component.html
Effect of substrate pretreatments on the atomic layer deposited Al2O3 passivation quality
Loading...
Access rights
openAccess
publishedVersion
URL
Journal Title
Journal ISSN
Volume Title
A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
This publication is imported from Aalto University research portal.
View publication in the Research portal (opens in new window)
View/Open full text file from the Research portal (opens in new window)
Other link related to publication (opens in new window)
View publication in the Research portal (opens in new window)
View/Open full text file from the Research portal (opens in new window)
Other link related to publication (opens in new window)
Unless otherwise stated, all rights belong to the author. You may download, display and print this publication for Your own personal use. Commercial use is prohibited.
Date
Department
Major/Subject
Mcode
Degree programme
Language
en
Pages
4
Series
Journal of Vacuum Science & Technology A, Volume 33, issue 1
Description
VK: T40310
Keywords
Other note
Citation
Bao, Y, Li, S, von Gastrow, G, Repo, P, Putkonen, M & Savin, H 2015, 'Effect of substrate pretreatments on the atomic layer deposited Al2O3 passivation quality', Journal of Vacuum Science & Technology A, vol. 33, no. 1, 01A123. https://doi.org/10.1116/1.4901456