Effect of substrate pretreatments on the atomic layer deposited Al2O3 passivation quality
Loading...
Access rights
openAccess
Journal Title
Journal ISSN
Volume Title
A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
This publication is imported from Aalto University research portal.
View publication in the Research portal
View/Open full text file from the Research portal
Other link related to publication
View publication in the Research portal
View/Open full text file from the Research portal
Other link related to publication
Date
2015
Major/Subject
Mcode
Degree programme
Language
en
Pages
4
Series
JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A, Volume 33, issue 1
Description
VK: T40310
Keywords
Other note
Citation
Bao , Y , Li , S , von Gastrow , G , Repo , P , Putkonen , M & Savin , H 2015 , ' Effect of substrate pretreatments on the atomic layer deposited Al2O3 passivation quality ' , Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films , vol. 33 , no. 1 , 01A123 . https://doi.org/10.1116/1.4901456
