Effect of substrate pretreatments on the atomic layer deposited Al2O3 passivation quality
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A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
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en
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4
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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Volume 33, issue 1
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VK: T40310
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Bao, Y, Li, S, von Gastrow, G, Repo, P, Putkonen, M & Savin, H 2015, 'Effect of substrate pretreatments on the atomic layer deposited Al2O3 passivation quality', Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, vol. 33, no. 1, 01A123. https://doi.org/10.1116/1.4901456