Catalyst-free growth of In(As)P nanowires on silicon
School of Electrical Engineering | A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
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Applied Physics Letters, Volume 89, Issue 6
AbstractThe catalyst-free metal organic vapor phase epitaxialgrowth of In(As)P nanowires on silicon substrates is investigated using in situ deposited In droplets as seeds for nanowiregrowth. The thin substrate native oxide is found to play a crucial role in the nanowire formation. The structure of the nanowires is characterized by photoluminescence and electron microscopy measurements. The crystal structure of the InPnanowires is wurtzite with its c axis perpendicular to the nanowire axis. Adding arsenic precursor to the gas phase during growth results in a bimodal photoluminescence spectrum exhibiting peak at the InAsP and InP band gap energies.
nanowires, photoluminescence, III‐V semiconductors, fluid drops, semiconductor growth, InP, silicon
Mattila, M. & Hakkarainen, T. & Lipsanen, Harri & Jiang, H. & Kauppinen, E. I. 2006. Catalyst-free growth of In(As)P nanowires on silicon. Applied Physics Letters. Volume 89, Issue 6. P. 063119/1-3. ISSN 0003-6951 (printed). DOI: 10.1063/1.2336599.