Thermal stability of in-grown vacancy defects in GaN grown by hydride vapor phase epitaxy
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© 2006 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the authors and the American Institute of Physics. The following article appeared in Journal of Applied Physics, Volume 99, Issue 6 and may be found at http://scitation.aip.org/content/aip/journal/jap/99/6/10.1063/1.2180450.
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A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
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Date
2006
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Degree programme
Language
en
Pages
066105/1-3
Series
Journal of Applied Physics, Volume 99, Issue 6
Abstract
We have used positron annihilation spectroscopy to study the thermal behavior of different native vacancy defects typical of freestanding GaN grown by hydride vapor phase epitaxy under high pressure annealing at different annealing temperatures. The results show that the VGa‐ON pairs dissociate and the Ga vacancies anneal out from the bulk of the material at temperatures 1500–1700K. A binding energy of Eb=1.6(4)eV can be determined for the pair. Thermal formation of Ga vacancies is observed at the annealing temperatures above 1700K, indicating that Ga vacancies are created thermally at the high growth temperature, but their ability to form complexes such as VGa‐ON determines the fraction of vacancy defects surviving the cooling down. The formation energy of the isolated Ga vacancy is experimentally determined.Description
Keywords
GaN, vacancy defects, thermal stability
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Citation
Tuomisto, Filip & Saarinen, K. & Paskova, T. & Monemar, B. & Bockowski, M. & Suski, T. 2006. Thermal stability of in-grown vacancy defects in GaN grown by hydride vapor phase epitaxy. Journal of Applied Physics. Volume 99, Issue 6. 066105/1-3. ISSN 0021-8979 (printed). DOI: 10.1063/1.2180450