Vibrations of the Interstitial Oxygen Pairs in Silicon

dc.contributorAalto-yliopistofi
dc.contributorAalto Universityen
dc.contributor.authorPesola, M.
dc.contributor.authorvon Boehm, J.
dc.contributor.authorNieminen, Risto M.
dc.contributor.departmentTeknillisen fysiikan laitosfi
dc.contributor.departmentDepartment of Applied Physicsen
dc.contributor.schoolPerustieteiden korkeakoulufi
dc.contributor.schoolSchool of Scienceen
dc.date.accessioned2015-09-02T09:02:19Z
dc.date.available2015-09-02T09:02:19Z
dc.date.issued1999
dc.description.abstractFirst-principles methods are used to calculate the structures and local vibrational modes of interstitial oxygen pairs in silicon. The staggered Oi−Si−Oi and skewed Oi−Si−Si−Oi structures are nearly degenerate in energy. The calculated local vibration frequencies and their pure and mixed 18O→16O isotopic shifts agree closely with experiments: the highest frequency is assigned to the skewed and the four lower ones to the staggered structure. This result may clear up the controversy of oxygen dimers in silicon, and also suggests a mechanism for fast oxygen diffusion.en
dc.description.versionPeer revieweden
dc.format.extent4022-4025
dc.format.mimetypeapplication/pdfen
dc.identifier.citationPesola, M. & von Boehm, J. & Nieminen, Risto M. 1999. Vibrations of the Interstitial Oxygen Pairs in Silicon. Physical Review Letters. Volume 82, Issue 20. 4022-4025. ISSN 0031-9007 (printed). DOI: 10.1103/physrevlett.82.4022.en
dc.identifier.doi10.1103/physrevlett.82.4022
dc.identifier.issn0031-9007 (printed)
dc.identifier.urihttps://aaltodoc.aalto.fi/handle/123456789/17564
dc.identifier.urnURN:NBN:fi:aalto-201509024183
dc.language.isoenen
dc.publisherAmerican Physical Society (APS)en
dc.relation.ispartofseriesPhysical Review Lettersen
dc.relation.ispartofseriesVolume 82, Issue 20
dc.rights© 1999 American Physical Society (APS). This is the accepted version of the following article: Pesola, M. & von Boehm, J. & Nieminen, Risto M. 1999. Vibrations of the Interstitial Oxygen Pairs in Silicon. Physical Review Letters. Volume 82, Issue 20. 4022-4025. ISSN 0031-9007 (printed). DOI: 10.1103/physrevlett.82.4022, which has been published in final form at http://journals.aps.org/prl/abstract/10.1103/PhysRevLett.82.4022.en
dc.rights.holderAmerican Physical Society (APS)
dc.subject.keywordvibrationsen
dc.subject.keywordsiliconen
dc.subject.keywordoxygen defectsen
dc.subject.otherPhysicsen
dc.titleVibrations of the Interstitial Oxygen Pairs in Siliconen
dc.typeA1 Alkuperäisartikkeli tieteellisessä aikakauslehdessäfi
dc.type.dcmitypetexten
dc.type.versionFinal published versionen

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