Influence of V/III molar ratio on the formation of In vacancies in InN grown by metal-organic vapor-phase epitaxy
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A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
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en
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3
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Applied Physics Letters, Volume 89, issue 1, pp. 1-3
Abstract
We have applied a slow positron beam to study InN samples grown by metal-organic vapor-phase epitaxy with different V/III molar ratios (3300–24 000) and at different growth temperatures (550–625°C). Indium vacancies were identified in samples grown at V/III ratios below 4000. Their concentration is in the 1017cm−3 range. No strong dependence of vacancy concentration on the molar ratio was observed. At low V/III ratios, however, In droplets and vacancy clusters are formed near the substrate interface. The elevated growth temperature enhances the In vacancy formation, possibly due to limited sticking of In on the growth surface close to the decomposition temperature.Description
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Pelli, A, Saarinen, K, Tuomisto, F, Ruffenach, S & Briot, O 2006, 'Influence of V/III molar ratio on the formation of In vacancies in InN grown by metal-organic vapor-phase epitaxy', Applied Physics Letters, vol. 89, no. 1, 011911, pp. 1-3. https://doi.org/10.1063/1.2219335