Review Article : Recommended reading list of early publications on atomic layer deposition - Outcome of the "Virtual Project on the History of ALD"

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Volume Title
A2 Katsausartikkeli tieteellisessä aikakauslehdessä
Date
2017-01-01
Department
Department of Chemistry
Stanford University
Department of Materials Science and Engineering
Centre National de la Recherche Scientifique (CNRS)
University of Twente
Bulgarian Academy of Sciences
Masaryk University
Huazhong University of Science and Technology
Université Grenoble Alpes
Ghent University
Ruhr University Bochum
St. Petersburg State University
Alikhanov Institute for Theoretical and Experimental Physics
Fondazione Bruno Kessler
VTT Technical Research Centre of Finland
Lam Research Corporation
Seoul National University
Global Foundries, Inc.
St. Petersburg State Electrotechnical University
Massachusetts Institute of Technology MIT
Techinsights
Ioffe Institute
SENTECH Instruments GmbH
NovaldMedical Ltd Oy
STMicroelectronics
Seagate Technology
University of Helsinki
Department of Micro and Nanosciences
St. Petersburg State Institute of Technology
Renewable Energy Development Center
Chemnitz University of Technology
Summa Semiconductor Oy
Military University of Technology Warsaw
ASELSAN Inc.
Linköping University
KOBUS
Department of Chemical and Metallurgical Engineering
Department of Applied Physics
Tallinn University of Technology
Netherlands Organisation for Applied Scientific Research
University of Jyväskylä
University of Maryland, College Park
Institut de recherche et développement sur l’énergie photovoltaïque
Seitek50
Fraunhofer Institute for Ceramic Technologies and Systems
Lund University
Uppsala University
Delft University of Technology
National Research Council of Italy
Immanuel Kant Baltic Federal University
Department of Chemistry and Materials Science
Department of Electronics and Nanoengineering
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Mcode
Degree programme
Language
en
Pages
13
Series
JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A, Volume 35, issue 1
Abstract
Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and developed independently, at least twice, under different names: atomic layer epitaxy (ALE) and molecular layering. ALE, dating back to 1974 in Finland, has been commonly known as the origin of ALD, while work done since the 1960s in the Soviet Union under the name "molecular layering" (and sometimes other names) has remained much less known. The virtual project on the history of ALD (VPHA) is a volunteer-based effort with open participation, set up to make the early days of ALD more transparent. In VPHA, started in July 2013, the target is to list, read and comment on all early ALD academic and patent literature up to 1986. VPHA has resulted in two essays and several presentations at international conferences. This paper, based on a poster presentation at the 16th International Conference on Atomic Layer Deposition in Dublin, Ireland, 2016, presents a recommended reading list of early ALD publications, created collectively by the VPHA participants through voting. The list contains 22 publications from Finland, Japan, Soviet Union, United Kingdom, and United States. Up to now, a balanced overview regarding the early history of ALD has been missing; the current list is an attempt to remedy this deficiency.
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Ahvenniemi , E , Akbashev , A R , Ali , S , Bechelany , M , Berdova , M , Boyadjiev , S , Cameron , D C , Chen , R , Chubarov , M , Cremers , V , Devi , A , Drozd , V , Elnikova , L , Gottardi , G , Grigoras , K , Hausmann , D M , Hwang , C S , Jen , S H , Kallio , T , Kanervo , J , Khmelnitskiy , I , Kim , D H , Klibanov , L , Koshtyal , Y , Krause , A O I , Kuhs , J , Kärkkänen , I , Kääriäinen , M L , Kääriäinen , T , Lamagna , L , Łapicki , A A , Leskelä , M , Lipsanen , H , Lyytinen , J , Malkov , A , Malygin , A , Mennad , A , Militzer , C , Molarius , J , Norek , M , Özgit-Akgün , Ç , Panov , M , Pedersen , H , Piallat , F , Popov , G , Puurunen , R L , Rampelberg , G , Ras , R H A , Rauwel , E , Roozeboom , F , Sajavaara , T , Salami , H , Savin , H , Schneider , N , Seidel , T E , Sundqvist , J , Suyatin , D B , Törndahl , T , Van Ommen , J R , Wiemer , C , Ylivaara , O M E & Yurkevich , O 2017 , ' Review Article : Recommended reading list of early publications on atomic layer deposition - Outcome ofthe "Virtual Project on the History of ALD" ' , JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A , vol. 35 , no. 1 , 010801 , pp. 1-13 . https://doi.org/10.1116/1.4971389