Atomic/molecular layer deposition of cerium(iii) hybrid thin films using rigid organic precursors

No Thumbnail Available
Journal Title
Journal ISSN
Volume Title
A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
Date
2022-04-14
Major/Subject
Mcode
Degree programme
Language
en
Pages
5603-5611
Series
Dalton Transactions, Volume 51, issue 14
Abstract
An atomic/molecular layer deposition (ALD/MLD) process for the fabrication of cerium-based metal-organic hybrid films is demonstrated for the first time. The highly reactive cerium(iii) guanidinate precursor [Ce(dpdmg)3] was employed in combination with organic precursors composed of rigid backbones, terephthalic acid (TPA) and hydroquinone (HQ) for the growth of the respective hybrid films. Growth rates of the films as high as 5.4 Å per cycle for Ce-TPA and 4.8 Å per cycle for Ce-HQ at a deposition temperature of 200 °C were obtained. Density functional theory (DFT) investigations confirm the favorable interaction between the cerium precursor and the organic co-reactants and predict that Ce maintains its +3 oxidation state in the films. This was also confirmed experimentally by X-ray photoelectron spectroscopy (XPS). Additionally, the films are highly UV absorbing. Hence, we envision that these films could find future application as promising redox active materials and/or UV absorbing materials.
Description
| openaire: EC/H2020/765378/EU//HYCOAT Funding Information: This project has received funding from the European Union's Horizon 2020 research and innovation programme under the Marie Skłodowska-Curie grant agreement (No. 765378). P. K., A. M. and R. G. thank HYCOAT for the early-stage researcher (ESR) fellowships. AD acknowledges the additional funding support from the DFG-SFB-TR-87. P. K., M. S., R. G. and M. K. acknowledge the use of the RawMatTERS Finland Infrastructure (RAMI) at Aalto University. MN acknowledges support from Science Foundation Ireland, through the SFI-NSFC Partnership Program, project NITRALD 17/NSFC/5279. A. M. and M. N. acknowledge support from Science Foundation Ireland for computational resources at Tyndall National Institute. Publisher Copyright: © 2022 The Royal Society of Chemistry
Keywords
Other note
Citation
Kaur , P , Muriqi , A , Wree , J L , Ghiyasi , R , Safdar , M , Nolan , M , Karppinen , M & Devi , A 2022 , ' Atomic/molecular layer deposition of cerium(iii) hybrid thin films using rigid organic precursors ' , Dalton Transactions , vol. 51 , no. 14 , pp. 5603-5611 . https://doi.org/10.1039/d2dt00353h