aalto1 untyped-item.component.html
Comparison of thin-film thickness measurements using ellipsometry and reflectometry with uniform samples
Loading...
Access rights
openAccess
CC BY
CC BY
Creative Commons license
Except where otherwised noted, this item's license is described as openAccess
publishedVersion
URL
Journal Title
Journal ISSN
Volume Title
A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
This publication is imported from Aalto University research portal.
View publication in the Research portal (opens in new window)
View/Open full text file from the Research portal (opens in new window)
Other link related to publication (opens in new window)
View publication in the Research portal (opens in new window)
View/Open full text file from the Research portal (opens in new window)
Other link related to publication (opens in new window)
Unless otherwise stated, all rights belong to the author. You may download, display and print this publication for Your own personal use. Commercial use is prohibited.
Date
Major/Subject
Mcode
Degree programme
Language
en
Pages
14
Series
Metrologia, Volume 63, issue 1, pp. 1-14
Abstract
This study evaluates spectroscopic ellipsometry and reflectometry using high-quality SiO2 and Al2O3 thin-films on Si substrates, thereby facilitating a detailed assessment of consistency of measurement results and uncertainty analyses. The results with detailed uncertainty budgets indicate good agreement between the two methods across a broad layer thickness range from 10 nm to 2000 nm, with deviations remaining well within the measurement uncertainties. Ellipsometry results have lower uncertainty than reflectometry results especially with the thinner layers, whereas reflectometry uncertainties are lower with the thickest layers studied. This work underscores the importance of rigorous thickness characterization and reliable uncertainty evaluation as critical factors in advancing both modeling and measurement practices in thin-film metrology.
Description
Keywords
Other note
Citation
Rastgou, M, Hulagu, D, Danilenko, A, Manoocheri, F, Hertwig, A & Ikonen, E 2026, 'Comparison of thin-film thickness measurements using ellipsometry and reflectometry with uniform samples', Metrologia, vol. 63, no. 1, 015006, pp. 1-14. https://doi.org/10.1088/1681-7575/ae3964