New s-Block Metal Pyridinedicarboxylate Network Structures through Gas-Phase Thin-Film Synthesis

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A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
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Chemistry: A European Journal, Volume 25, issue 49, pp. 11466-11473

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The combined atomic and molecular layer deposition (ALD/MLD) technique offers a unique way to build—both known and previously unknown—crystalline coordination polymer materials directly from gaseous precursors in a high-quality thin-film form. Here, we demonstrate the ALD/MLD of crystalline Li-, Na-, and K-based 3,5-pyridinedicarboxylate (3,5-PDC) thin films; the Li2-3,5-PDC films are of the known Li-ULMOF-4 crystal structure whereas the other as-deposited crystalline films possess structures not previously reported. Another exciting possibility offered by ALD/MLD is the deposition of well-defined but amorphous metal–organic thin films, such as our Mg-, Ca-, Sr-, and Ba-based 3,5-PDC films, which can then be crystallized into water-containing structures through a post-deposition humidity treatment. All together, the new metal–organic structures realized in this study through ALD/MLD comprise a majority of the (anhydrous and water-containing) members of the s-block metal 3,5-pyridinedicarboxylate family.

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| openaire: EC/H2020/339478/EU//LAYERENG-HYBMAT

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Penttinen, J, Nisula, M & Karppinen, M 2019, 'New s-Block Metal Pyridinedicarboxylate Network Structures through Gas-Phase Thin-Film Synthesis', Chemistry: A European Journal, vol. 25, no. 49, pp. 11466-11473. https://doi.org/10.1002/chem.201901034