Development of hafnium and aluminum oxide processes in a new laminar flow atomic layer deposition reactor

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Journal Title
Journal ISSN
Volume Title
Kemian tekniikan korkeakoulu | Master's thesis
Author
Date
2021-05-18
Department
Major/Subject
Chemical and Process Engineering
Mcode
CHEM3043
Degree programme
Master's Programme in Chemical, Biochemical and Materials Engineering
Language
en
Pages
60
Series
Description
Supervisor
Puurunen, Riikka
Thesis advisor
Blomberg, Tom
Keywords
atomic layer deposition, hafnium oxide, aluminium oxide, design of experiments, Plackett-Burman design
Other note
Citation
Permanent link to this item
https://urn.fi/URN:NBN:fi:aalto-202105236871
Collections
[dipl] Kemian tekniikan korkeakoulu / CHEM