Patterning of Heteroepitaxial Overlayers from Nano to Micron Scales

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© 2012 American Physical Society (APS). http://www.aps.org/

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Volume Title

School of Science | A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä

Date

2012

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Mcode

Degree programme

Language

en

Pages

226102/1-5

Series

Physical Review Letters, Volume 108, Issue 22

Abstract

Thin heteroepitaxial overlayers have been proposed as templates to generate stable, self-organized nanostructures at large length scales, with a variety of important technological applications. However, modeling strain-driven self-organization is a formidable challenge due to different length scales involved. In this Letter, we present a method for predicting the patterning of ultrathin films on micron length scales with atomic resolution. We make quantitative predictions for the type of superstructures (stripes, honeycomb, triangular) and length scale of pattern formation of two metal-metal systems, Cu on Ru(0001) and Cu on Pd(111). Our findings are in excellent agreement with previous experiments and call for future experimental investigations of such systems.

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Keywords

pattern formation, heteroepitaxy, phase-field crystal

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Citation

Elder, K. R. & Rossi, G. & Kanerva, P. & Sanches, F. & Ying, S-C. & Granato, E. & Achim, C. V. & Ala-Nissilä, Tapio. 2012. Patterning of Heteroepitaxial Overlayers from Nano to Micron Scales. Physical Review Letters. Volume 108, Issue 22. P. 226102/1-5. ISSN 0031-9007 (printed). DOI: 10.1103/physrevlett.108.226102.