Patterning of Heteroepitaxial Overlayers from Nano to Micron Scales

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© 2012 American Physical Society (APS). http://www.aps.org/
Journal Title
Journal ISSN
Volume Title
School of Science | A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
Date
2012
Major/Subject
Mcode
Degree programme
Language
en
Pages
226102/1-5
Series
Physical Review Letters, Volume 108, Issue 22
Abstract
Thin heteroepitaxial overlayers have been proposed as templates to generate stable, self-organized nanostructures at large length scales, with a variety of important technological applications. However, modeling strain-driven self-organization is a formidable challenge due to different length scales involved. In this Letter, we present a method for predicting the patterning of ultrathin films on micron length scales with atomic resolution. We make quantitative predictions for the type of superstructures (stripes, honeycomb, triangular) and length scale of pattern formation of two metal-metal systems, Cu on Ru(0001) and Cu on Pd(111). Our findings are in excellent agreement with previous experiments and call for future experimental investigations of such systems.
Description
Keywords
pattern formation, heteroepitaxy, phase-field crystal
Other note
Citation
Elder, K. R. & Rossi, G. & Kanerva, P. & Sanches, F. & Ying, S-C. & Granato, E. & Achim, C. V. & Ala-Nissilä, Tapio. 2012. Patterning of Heteroepitaxial Overlayers from Nano to Micron Scales. Physical Review Letters. Volume 108, Issue 22. P. 226102/1-5. ISSN 0031-9007 (printed). DOI: 10.1103/physrevlett.108.226102.