Carrier capture processes in strain-induced InxGa1-xAs/GaAs quantum dot structures
Loading...
Access rights
© 2000 American Physical Society (APS). http://www.aps.org/
URL
Journal Title
Journal ISSN
Volume Title
School of Electrical Engineering |
A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
Unless otherwise stated, all rights belong to the author. You may download, display and print this publication for Your own personal use. Commercial use is prohibited.
Date
2000
Major/Subject
Mcode
Degree programme
Language
en
Pages
13588-13594
Series
Physical Review B, Volume 62, Issue 20
Abstract
We investigate carrier capture processes in strain-induced quantum dot structures. The quantum dots consist of a near-surface InGaAs/GaAs quantum well in which a lateral confining potential is generated by the strain from InP stressor islands grown on the sample surface. Using photoluminescence spectroscopy, we show that the rate of carrier capture into the quantum dots increases dramatically when the energetic depth of the confinement potential is reduced by enlarging the quantum well/surface separation D. While carriers in the quantum well region between the quantum dots are found to experience D-dependent nonradiative surface recombination, this process seems to be negligible for carriers in the quantum dots, presumably due to the protecting InP islands.Description
Keywords
carrier capture processes, quantum dots, quantum wells, photoluminescence spectroscopy
Other note
Citation
Lingk, C. & Helfer, W. & von Plessen, G. & Feldmann, J. & Stock, K. & Feise, M. W. & Citrin, D. S. & Lipsanen, Harri & Sopanen, M. & Virkkala, R. & Tulkki, J. & Ahopelto, J.. 2000. Carrier capture processes in strain-induced InxGa1-xAs/GaAs quantum dot structures. Physical Review B. Volume 62, Issue 20. P. 13588-13594. ISSN 1098-0121 (printed). DOI: 10.1103/physrevb.62.13588.