Improvement of industrial scale photolithography control and process in 3D microLED industry
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School of Chemical Engineering |
Master's thesis
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Date
2024-09-10
Department
Major/Subject
Functional Materials for Global Challenges
Mcode
Degree programme
Master's Programme in Advanced Materials for Innovation and Sustainability
Language
en
Pages
66
Series
Abstract
This work presents the characterisation and enhancement of industrial-scale photolithography technologies utilised in the 3D microLED industry. Important facets of photolithography are included in the study, such as metrology, development procedures, statistical process control (SPC), and uniformity improvement. Hexamethyldisilazane (HMDS) contact angle is carefully evaluated, and defectivity is monitored during the photolithography process. The mean, standard deviation, and frequency of defects are tracked and managed using SPC charts. The thesis also looks into ways to improve the uniformity of photoresist thickness after development and minimise the amount of developer and deionized water used in the photolithography process. The outcomes of the experiments show notable increases in process efficiency and stability, which improves microLED output overall. The modification of the developper recipe and adjustment of the UV light intensity of the mask aligner dropped the uniformity of the thickness of developed photoresist from 20,3 % to 6,2 %. The creation of a new recipe to optimise the consumption of TMAH cut the volume used by half. This study emphasises the significance of exact process control and resource optimisation, offering insightful information and workable ideas for improving photolithography procedures in the microelectronics sector.Description
Supervisor
Franssila, SamiThesis advisor
Gibert, PhilippeKeywords
photolithography, SPC, metrology, development, uniformity, photoresist