Corrosion protection of steel with multilayer coatings: Improving the sealing properties of physical vapor deposition CrN coatings with Al2O3/ TiO2 atomic layer deposition nanolaminates

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A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
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Authors

Date

2017-04

Department

Department of Electronics and Nanoengineering
Department of Electrical Engineering and Automation
Department of Chemistry and Materials Science
Department of Materials Science and Engineering
Department of Micro and Nanosciences
Department of Chemical and Metallurgical Engineering

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Mcode

Degree programme

Language

en

Pages

10
59-68

Series

Thin Solid Films, Volume 627

Abstract

Atomic Layer Deposition (ALD) of Al2O3/TiO2 nanolaminatewas applied to improve the sealing properties of CrN coating deposited with Physical Vapor Deposition (PVD) on high speed steel (HSS). The corrosion protection propertieswere explored with Linear Sweep Voltammetry and visual estimation. Nearly two orders of magnitude decrease in corrosion current density was obtained by applying plasma pre-treatment prior to ALD coating. Sealing of CrN pinholes was shown with Focused Ion Beam/Scanning Electron Microscope technique. The effect of the ALD deposition parameters to adhesion of the ALD coatings was investigated with Rockwell indentation and microscope analysis. Thickness and refractive index of the ALD coatings were measured with ellipsometry, and density and roughness of the ALD coatingswere investigatedwith X-Ray Reflectivity measurements. Neutral Salt Spray testing was used to investigate the corrosion resistance of PVD/ALD nanolaminates on HSS dental curettes.

Description

Keywords

CORROSION, defects, Electrochemical properties, Multilayer, Physical vapor deposition, Atomic layer Deposition, Thin films, STEEL

Other note

DOI

10.1016/j.tsf.2017.02.050

Citation

Leppäniemi, J, Sippola, P, Broas, M, Aromaa, J, Lipsanen, H & Koskinen, J 2017, ' Corrosion protection of steel with multilayer coatings: Improving the sealing properties of physical vapor deposition CrN coatings with Al2O3/ TiO2 atomic layer deposition nanolaminates ', Thin Solid Films, vol. 627, pp. 59-68 . https://doi.org/10.1016/j.tsf.2017.02.050

Permanent link to this item

https://urn.fi/URN:NBN:fi:aalto-201711217571

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[article-cris] Kemian tekniikan korkeakoulu / CHEM