Focused ion beam high resolution grayscale lithography for silicon-based nanostructures

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dc.contributorAalto-yliopistofi
dc.contributorAalto Universityen
dc.contributor.authorErdmanis, Mikhail
dc.contributor.authorTittonen, Ilkka
dc.contributor.departmentDepartment of Micro and Nanosciencesen
dc.contributor.groupauthorIlkka Tittonen Groupen
dc.date.accessioned2018-08-01T13:28:46Z
dc.date.available2018-08-01T13:28:46Z
dc.date.issued2014
dc.description.versionPeer revieweden
dc.format.mimetypeapplication/pdf
dc.identifier.citationErdmanis, M & Tittonen, I 2014, 'Focused ion beam high resolution grayscale lithography for silicon-based nanostructures', Applied Physics Letters, vol. 104, no. 073118, pp. 1-5. https://doi.org/10.1063/1.4866586en
dc.identifier.doi10.1063/1.4866586
dc.identifier.issn0003-6951
dc.identifier.issn1077-3118
dc.identifier.otherPURE UUID: 6b67f40b-a324-4737-ba9b-9dc19f69d923
dc.identifier.otherPURE ITEMURL: https://research.aalto.fi/en/publications/6b67f40b-a324-4737-ba9b-9dc19f69d923
dc.identifier.otherPURE LINK: http://scitation.aip.org/content/aip/journal/apl/104/7/10.1063/1.4866586
dc.identifier.otherPURE FILEURL: https://research.aalto.fi/files/26487914/1.4866586.pdf
dc.identifier.urihttps://aaltodoc.aalto.fi/handle/123456789/32800
dc.identifier.urnURN:NBN:fi:aalto-201808014201
dc.language.isoenen
dc.publisherAmerican Institute of Physics
dc.relation.ispartofseriesApplied Physics Lettersen
dc.relation.ispartofseriesVolume 104, issue 073118, pp. 1-5en
dc.rightsopenAccessen
dc.titleFocused ion beam high resolution grayscale lithography for silicon-based nanostructuresen
dc.typeA1 Alkuperäisartikkeli tieteellisessä aikakauslehdessäfi
dc.type.versionpublishedVersion

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