Focused ion beam high resolution grayscale lithography for silicon-based nanostructures
Loading...
Access rights
openAccess
publishedVersion
URL
Journal Title
Journal ISSN
Volume Title
A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
This publication is imported from Aalto University research portal.
View publication in the Research portal (opens in new window)
View/Open full text file from the Research portal (opens in new window)
Other link related to publication (opens in new window)
View publication in the Research portal (opens in new window)
View/Open full text file from the Research portal (opens in new window)
Other link related to publication (opens in new window)
Authors
Date
2014
Department
Major/Subject
Mcode
Degree programme
Language
en
Pages
Series
Applied Physics Letters, Volume 104, issue 073118, pp. 1-5
Description
Keywords
Other note
Citation
Erdmanis, M & Tittonen, I 2014, ' Focused ion beam high resolution grayscale lithography for silicon-based nanostructures ', Applied Physics Letters, vol. 104, no. 073118, pp. 1-5 . https://doi.org/10.1063/1.4866586