One-Antenna Radiation Pattern Measurement of On-Wafer Antennas in Probe Station Environment
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A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
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en
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9
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PROGRESS IN ELECTROMAGNETICS RESEARCH-PIER, Volume 167, pp. 31-39
Abstract
We propose and demonstrate the use of radiation pattern measurement method for on-wafer antennas for the first time that is capable of in-depth antenna characterization with limited equipment. This one-antenna method extracts gain without the need for a second antenna in the on-wafer probe station environment. A combination of reference reflector translation and rotation allows radiation pattern sampling at multiple angles enabling characterization over the relevant solid angle. Several microstrip patch antennas with varying beam directions (0˚, 20˚, and 30˚) were measured with the proposed method over 120˚ in the H-plane with good agreement between simulation and experiment. The method offers a cost-effective and time-efficient solution for probe-fed, on-wafer antenna radiation performance characterization.Description
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Zheng, J, Ala-Laurinaho, J, Taylor, Z & Räisänen, A 2020, 'One-Antenna Radiation Pattern Measurement of On-Wafer Antennas in Probe Station Environment', PROGRESS IN ELECTROMAGNETICS RESEARCH-PIER, vol. 167, pp. 31-39. < http://www.jpier.org/PIER/pier.php?paper=19121807 >