Area-selective atomic/molecular layer deposition via block copolymer approach: Zn-benzene dithiol deposition as a case study

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A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
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Date

2025-10-03

Department

Department of Chemistry and Materials Science
Department of Bioproducts and Biosystems

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Mcode

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Language

en

Pages

10

Series

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Volume 43, issue 6

Abstract

We have developed a novel atomic/molecular layer deposition (ALD/MLD) process for the growth of essentially air-stable zinc-organic thin films from diethyl zinc and 1,4-benzene dithiol (BDT) precursors at an appreciably low deposition temperature of 60 °C. The low deposition temperature along with the high film growth rate of 3.96 Å/cycle achieved with relatively short precursor pulse lengths allowed us to employ the process for area-selective (AS) ALD/MLD on block copolymer (BCP) substrates, not challenged before. Our study showed that on the chosen polystyrene-b-poly(ethylene oxide) (PS-b-PEO) BCP substrates, the Zn-BDT film grows in an AS manner such that the growth most likely occurs preferentially on the PEO domains. We believe the BCP-based AS-ALD/MLD approach represents an alternative nanopatterning technique to the conventional photolithography, which could be highly beneficial particularly in next-generation flexible applications.

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| openaire: EC/HE/101097815/EU//UniEn-MLD

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DOI

10.1116/6.0004848

Citation

Partanen, O, George, L, Philip, A, Kostiainen, M A & Karppinen, M 2025, 'Area-selective atomic/molecular layer deposition via block copolymer approach: Zn-benzene dithiol deposition as a case study', Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, vol. 43, no. 6, 062405. https://doi.org/10.1116/6.0004848

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https://urn.fi/URN:NBN:fi:aalto-202511058646

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[article-cris] Kemian tekniikan korkeakoulu / CHEM