Physical mechanisms of boron diffusion gettering of iron in silicon

Loading...
Thumbnail Image

Access rights

openAccess
acceptedVersion

URL

Journal Title

Journal ISSN

Volume Title

A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä

Date

Major/Subject

Mcode

Degree programme

Language

en

Pages

Series

Physica Status Solidi: Rapid Research Letters, Volume 4, issue 5-6, pp. 136-138

Description

Other note

Citation

Vähänissi, V, Haarahiltunen, A, Talvitie, H, Yli-Koski, M, Lindroos, J & Savin, H 2010, 'Physical mechanisms of boron diffusion gettering of iron in silicon', Physica Status Solidi: Rapid Research Letters, vol. 4, no. 5-6, pp. 136-138. https://doi.org/10.1002/pssr.201004105