Green Lithography for Delicate Materials

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openAccess

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Volume Title

A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä

Date

2021-07-02

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Mcode

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Language

en

Pages

10

Series

Advanced Functional Materials

Abstract

A variety of unconventional materials, including biological nanostructures, organic and hybrid semiconductors, as well as monolayer, and other low-dimensional systems, are actively explored. They are usually incompatible with standard lithographic techniques that use harsh organic solvents and other detrimental processing. Here, a new class of green and gentle lithographic resists, compatible with delicate materials and capable of both top-down and bottom-up fabrication routines is developed. To demonstrate the excellence of this approach, devices with sub-micron features are fabricated on organic semiconductor crystals and individual animal's brain microtubules. Such structures are created for the first time, thanks to the genuinely water-based lithography, which opens an avenue for the thorough research of unconventional delicate materials at the nanoscale.

Description

Online Version of Record before inclusion in an issue 2101533 Funding Information: A.G. and A.B. contributed equally to this work. The authors thank Andrey Starkov for the help with illustrations and Dr. Ivan Shuklov for providing chemical reagents. A.G., K.M., V.D. thank the late Vsevolod Gantmakher for the inspiration and support provided at the beginning of this study. The development concept was designed under financial support by Russian Science Foundation under grant 19‐73‐10154. The experiments of the model developer investigation were supported by Russian Science Foundation under grant No. 18‐72‐10135. XPS was carried out with the support of the Research Facility Center at the Institute of Solid State Physics (RAS) (R.N.M. and A.M.I). This work was performed using equipment of MIPT Shared Facilities Center. F.S.F. acknowledges Russian Foundation for Basic Research grant no. 19‐07‐00300. V.P. acknowledges support from the National Science Foundation under the grant ECCS‐1806363. B.P.R. and J.T.D. acknowledge support from the National Science Foundation Award No. ECCS‐1709222. Section on the synthesis of chitosan acetate with various molecular weights was supported by Ministry of Science and Higher Education of the Russian Federation. A.I. expresses gratitude to the Russian Foundation for Basic Research (project no. 19‐29‐03021 mk) for supporting his work. A.K.G. acknowledge RFBR grant 19‐32‐90143. A.G.N. acknowledges the Russian Science Foundation (project No 17‐19‐01787‐synthesis of carbon nanotubes and project No 21‐72‐20050‐SWCNT transistor fabrication and characterisation). Publisher Copyright: © 2021 Wiley-VCH GmbH Copyright: Copyright 2021 Elsevier B.V., All rights reserved.

Keywords

bio-nanostructures, delicate materials, lithography, organic semiconductors

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Citation

Grebenko, A, Bubis, A, Motovilov, K, Dremov, V, Korostylev, E, Kindiak, I, Fedorov, F S, Luchkin, S, Zhuikova, Y, Trofimenko, A, Filkov, G, Sviridov, G, Ivanov, A, Dull, J T, Mozhchil, R, Ionov, A, Varlamov, V, Rand, B P, Podzorov, V & Nasibulin, A G 2021, ' Green Lithography for Delicate Materials ', Advanced Functional Materials, vol. 31, no. 27, 2101533 . https://doi.org/10.1002/adfm.202101533