Self-erasing and rewritable wettability patterns on ZnO thin films

dc.contributorAalto-yliopistofi
dc.contributorAalto Universityen
dc.contributor.authorKekkonen, Ville
dc.contributor.authorHakola, Antti
dc.contributor.authorKajava, Timo
dc.contributor.authorSahramo, Elina
dc.contributor.authorMalm, Jari
dc.contributor.authorKarppinen, Maarit
dc.contributor.authorRas, Robin H.A.
dc.contributor.departmentDepartment of Applied Physicsen
dc.contributor.departmentDepartment of Chemistryen
dc.contributor.groupauthorMolecular Materialsen
dc.date.accessioned2025-10-08T06:49:59Z
dc.date.available2025-10-08T06:49:59Z
dc.date.issued2010
dc.description.abstractSelf-erasing patterns allow a substrate to be patterned multiple times or could store temporary information for secret communications, and are mostly based on photochromic molecules to change the color of the pattern. Herein we demonstrate self-erasing patterns of wettability on thin ZnO films made by atomic layer deposition. Hydrophilic patterns are written using UV light and decay spontaneously, i.e. become hydrophobic, or are erased aided by vacuum conditions or heat. We demonstrate that these patterns can be applied for channels to confine flow of water without physical walls.en
dc.description.versionPeer revieweden
dc.format.extent3
dc.format.mimetypeapplication/pdf
dc.identifier.citationKekkonen, V, Hakola, A, Kajava, T, Sahramo, E, Malm, J, Karppinen, M & Ras, R H A 2010, 'Self-erasing and rewritable wettability patterns on ZnO thin films', Applied Physics Letters, vol. 97, no. 4, 044102, pp. 1-3. https://doi.org/10.1063/1.3460915en
dc.identifier.doi10.1063/1.3460915
dc.identifier.issn0003-6951
dc.identifier.issn1077-3118
dc.identifier.otherPURE UUID: 626752a1-06a0-4e7d-803d-4c06d9b379e7
dc.identifier.otherPURE ITEMURL: https://research.aalto.fi/en/publications/626752a1-06a0-4e7d-803d-4c06d9b379e7
dc.identifier.otherPURE LINK: http://dx.doi.org/10.1063/1.3460915
dc.identifier.otherPURE FILEURL: https://research.aalto.fi/files/14764976/1.3460915.pdf
dc.identifier.urihttps://aaltodoc.aalto.fi/handle/123456789/139574
dc.identifier.urnURN:NBN:fi:aalto-202510087755
dc.language.isoenen
dc.publisherAmerican Institute of Physics
dc.relation.ispartofseriesApplied Physics Lettersen
dc.relation.ispartofseriesVolume 97, issue 4, pp. 1-3en
dc.rightsopenAccessen
dc.subject.keywordlasers
dc.subject.keywordphotoinduced wetting
dc.titleSelf-erasing and rewritable wettability patterns on ZnO thin filmsen
dc.typeA1 Alkuperäisartikkeli tieteellisessä aikakauslehdessäfi
dc.type.versionpublishedVersion

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