Atomic/Molecular Layer Deposited Iron-Azobenzene Framework Thin Films for Stimuli-Induced Gas Molecule Capture/Release
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A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
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Date
2019-08-13
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Language
en
Pages
6
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Angewandte Chemie
Abstract
The atomic/molecular layer deposition (ALD/MLD) technique provides an elegant way to grow crystalline metal-azobenzene thin films directly from gaseous precursors; the photoactive azobenzene linkers thus form an integral part of the crystal framework. Reversible water capture/release behavior for these thin films can be triggered through the trans-cis photoisomerization reaction of the azobenzene moieties in the structure. The ALD/MLD approach could open up new horizons for example, for the emerging fields of remotely controlled drug delivery and gas storage.Description
| openaire: EC/H2020/339478/EU//LAYERENG-HYBMAT
Keywords
atomic layer deposition, azobenzene, metal-organic frameworks, molecular layer deposition, thin films, METAL-ORGANIC FRAMEWORKS, CARBON-DIOXIDE, XPS SPECTRA, ISOMERIZATION, CAPTURE, PHOTOISOMERIZATION, TRIMETHYLALUMINUM, ROUTE, ACIDS
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Citation
Khayyami, A, Philip, A & Karppinen, M 2019, ' Atomic/Molecular Layer Deposited Iron-Azobenzene Framework Thin Films for Stimuli-Induced Gas Molecule Capture/Release ', Angewandte Chemie . https://doi.org/10.1002/anie.201908164