Mask material effects in cryogenic deep reactive ion etching
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Journal Title
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Volume Title
A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
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Authors
Date
2007
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Mcode
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Language
en
Pages
801-807
Series
Journal of Vacuum Science and Technology. Part B., Volume 25, issue 3
Description
Keywords
alumina ALD, cryogenic, DRIE, etch mask, phoresist
Other note
Citation
Franssila , S & Sainiemi , L 2007 , ' Mask material effects in cryogenic deep reactive ion etching ' , Journal of Vacuum Science and Technology. Part B. , vol. 25 , no. 3 , pp. 801-807 . https://doi.org/10.1116/1.2734157