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Mask material effects in cryogenic deep reactive ion etching
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A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
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Journal of Vacuum Science & Technology B, Volume 25, issue 3, pp. 801-807
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Franssila, S & Sainiemi, L 2007, 'Mask material effects in cryogenic deep reactive ion etching', Journal of Vacuum Science & Technology B, vol. 25, no. 3, pp. 801-807. https://doi.org/10.1116/1.2734157