Nanoindentation of silicon surfaces: Molecular-dynamics simulations of atomic force microscopy

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dc.contributorAalto-yliopistofi
dc.contributorAalto Universityen
dc.contributor.authorAstala, R.
dc.contributor.authorKaukonen, M.
dc.contributor.authorNieminen, Risto M.
dc.contributor.authorHeine, T.
dc.contributor.departmentTeknillisen fysiikan laitosfi
dc.contributor.departmentDepartment of Applied Physicsen
dc.contributor.schoolPerustieteiden korkeakoulufi
dc.contributor.schoolSchool of Scienceen
dc.date.accessioned2015-08-12T09:01:08Z
dc.date.available2015-08-12T09:01:08Z
dc.date.issued2000
dc.description.abstractWe investigate the atomic-scale details of atomic force microscopy through a quasistatic molecular dynamics simulation together with a density-functional-based tight-binding method. The changes in the AFM tip shape, the size of the tip-sample contact area, as well as the microscopic hardness and Young’s moduli of silicon {111},{110},{100} surfaces are studied. Furthermore, the effects of hydrogen termination of the surface and of subsurface vacancies on hardness and Young’s modulus are discussed.en
dc.description.versionPeer revieweden
dc.format.extent2973-2980
dc.format.mimetypeapplication/pdfen
dc.identifier.citationAstala, R. & Kaukonen, M. & Nieminen, Risto M. & Heine, T. 2000. Nanoindentation of silicon surfaces: Molecular-dynamics simulations of atomic force microscopy. Physical Review B. Volume 61, Issue 4. 2973-2980. ISSN 1550-235X (electronic). DOI: 10.1103/physrevb.61.2973.en
dc.identifier.doi10.1103/physrevb.61.2973
dc.identifier.issn1550-235X (electronic)
dc.identifier.urihttps://aaltodoc.aalto.fi/handle/123456789/17381
dc.identifier.urnURN:NBN:fi:aalto-201508113993
dc.language.isoenen
dc.publisherAmerican Physical Society (APS)en
dc.relation.ispartofseriesPhysical Review Ben
dc.relation.ispartofseriesVolume 61, Issue 4
dc.rights© 2000 American Physical Society (APS). This is the accepted version of the following article: Astala, R. & Kaukonen, M. & Nieminen, Risto M. & Heine, T. 2000. Nanoindentation of silicon surfaces: Molecular-dynamics simulations of atomic force microscopy. Physical Review B. Volume 61, Issue 4. 2973-2980. ISSN 1550-235X (electronic). DOI: 10.1103/physrevb.61.2973, which has been published in final form at http://journals.aps.org/prb/abstract/10.1103/PhysRevB.61.2973.en
dc.rights.holderAmerican Physical Society (APS)
dc.subject.keywordatomic force microscopyen
dc.subject.keywordsilicon surfacesen
dc.subject.otherPhysicsen
dc.titleNanoindentation of silicon surfaces: Molecular-dynamics simulations of atomic force microscopyen
dc.typeA1 Alkuperäisartikkeli tieteellisessä aikakauslehdessäfi
dc.type.dcmitypetexten
dc.type.versionFinal published versionen

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