Nanoporous Metal-Organic Framework Thin Films Prepared Directly from Gaseous Precursors by Atomic and Molecular Layer Deposition: Implications for Microelectronics

Loading...
Thumbnail Image
Journal Title
Journal ISSN
Volume Title
A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
Date
2023-01-27
Major/Subject
Mcode
Degree programme
Language
en
Pages
5
827-831
Series
ACS Applied Nano Materials, Volume 6, issue 2
Abstract
Atomic/molecular layer deposition (ALD/MLD) allows for the direct gas-phase synthesis of crystalline metal-organic framework (MOF) thin films. Here, we show for the first time using krypton and methanol physisorption measurements that ALD/MLD-fabricated copper 1,4-benzenedicarboxylate (Cu-BDC) ultrathin films possess accessible porosity matching that of the corresponding bulk MOF.
Description
Funding Information: This project has received funding from the European Union’s Horizon 2020 research and innovation program under Marie Skłodowska-Curie Grant Agreement 765378 and from Academy of Finland (PREIN). V.R.-G. thanks the Research Foundation Flanders for a Junior Postdoctoral Fellowship (1263622N). The research leading to this result has been supported by the project CALIPSOplus under Grant Agreement 730872 from the EU Framework Programme for Research and Innovation Horizon 2020. We acknowledge the use of the RawMatters Finland Infrastructure at Aalto University as well as Elettra Sincrotrone Trieste for providing access to its synchrotron radiation facilities (Proposal 20210538) and thank Luisa Barba and Nicola Demitri for assistance using beamline XRD1. We thank Prof. Roland Resel for assistance in using GIDVis software. Publisher Copyright: © 2023 The Authors. Published by American Chemical Society.
Keywords
atomic layer deposition, krypton physisorption, metal-organic framework, methanol physisorption, molecular layer deposition, porous thin films
Other note
Citation
Multia , J , Kravchenko , D E , Rubio-Giménez , V , Philip , A , Ameloot , R & Karppinen , M 2023 , ' Nanoporous Metal-Organic Framework Thin Films Prepared Directly from Gaseous Precursors by Atomic and Molecular Layer Deposition: Implications for Microelectronics ' , ACS Applied Nano Materials , vol. 6 , no. 2 , pp. 827-831 . https://doi.org/10.1021/acsanm.2c04934