Analysis of the Atomic Layer Deposited Al2O3 field-effect passivation in black silicon

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Journal Title
Journal ISSN
Volume Title
A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
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Date
2015
Major/Subject
Mcode
Degree programme
Language
en
Pages
5
29-33
Series
SOLAR ENERGY MATERIALS AND SOLAR CELLS, Volume 142
Description
Keywords
Al2O3, atomic layer deposition, nano-texturing, negative charge, reactive ion etching, surface passivation
Other note
Citation
von Gastrow, G, Alcubilla, R, Ortega, P, Yli-Koski, M, Conesa-Boj, S, Fontcuberta i Morral, A & Savin, H 2015, ' Analysis of the Atomic Layer Deposited Al2O3 field-effect passivation in black silicon ', Solar Energy Materials and Solar Cells, vol. 142, pp. 29-33 . https://doi.org/10.1016/j.solmat.2015.05.027