Tunable Electrical and Optical Properties in Atomic Layer Deposited TiO2:Pt Thin Films via Dynamic Metallic Nanoparticle Formation
Loading...
Access rights
openAccess
CC BY
CC BY
publishedVersion
URL
Journal Title
Journal ISSN
Volume Title
A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
This publication is imported from Aalto University research portal.
View publication in the Research portal (opens in new window)
View/Open full text file from the Research portal (opens in new window)
Other link related to publication (opens in new window)
View publication in the Research portal (opens in new window)
View/Open full text file from the Research portal (opens in new window)
Other link related to publication (opens in new window)
Unless otherwise stated, all rights belong to the author. You may download, display and print this publication for Your own personal use. Commercial use is prohibited.
Date
Major/Subject
Mcode
Degree programme
Language
en
Pages
7
Series
Advanced Materials Interfaces, Volume 12, issue 17
Abstract
Composite TiO2:Pt thin films deposited by atomic layer deposition (ALD) exhibit significant temperature‑dependent resistivity transitions, from insulating to semiconducting to metallic‑like conducting behavior, while remaining transparent to visible light and strongly absorbing ultraviolet (UV) radiation. The composite films are fabricated using a supercycle approach, and the morphological, electrical, and optical properties are systematically investigated for a series of films with the cycle ratio varying from 4TiO2:1Pt to 1TiO2:4Pt. The thus deposited thin films, specifically those with 2TiO2:1Pt, 1TiO2:1Pt, and 1TiO2:2Pt ratios, consist of metallic Pt nanoparticles embedded within the anatase-type TiO2 matrix, in which the optical properties are primarily governed by the TiO2 component, whereas the electrical behavior depends on the Pt particle size and density. Notably, films with a 2TiO2:1Pt ratio undergo morphological alterations due to the nucleation of Pt nanoparticles beginning at temperatures slightly above room temperature (≈340 K), resulting in alterations in the electrical resistivity. These findings highlight the potential of ALD-grown TiO2:Pt composite thin films for applications in transparent electronics, optoelectronics, and photocatalytic systems.Description
Other note
Citation
Ghiyasi, R, Tewari, G C & Karppinen, M 2025, 'Tunable Electrical and Optical Properties in Atomic Layer Deposited TiO 2 :Pt Thin Films via Dynamic Metallic Nanoparticle Formation', Advanced Materials Interfaces, vol. 12, no. 17, e00594. https://doi.org/10.1002/admi.202500594