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Optimizing measurement accuracy in microscope-based reflectometry for thin film optical properties
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A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
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en
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11
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Measurement Science and Technology, Volume 36, issue 7, pp. 1-11
Abstract
Accurate characterization of thin film optical properties is important for the electronics and photonics industries. This paper focuses on optimizing measurement accuracy for microscope-based reflectometers with an on-axis incident beam. Key factors analyzed include the distribution of angles of incidence in microscope geometry, spectrometer bandwidth correction, and sample thickness variations. We develop a reflectance model incorporating these factors, improving fit quality essential for reliable uncertainty analysis. Validation measurements with SiO2 on Si layers (10-2000 nm) using a working standard gonio-reflectometer show consistent thickness values with the microscope-based reflectometer, confirming the reliability of the approach.
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Publisher Copyright: © 2025 The Author(s). Published by IOP Publishing Ltd.
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Rastgou, M, Danilenko, A, Peltoniemi, J, Manoocheri, F & Ikonen, E 2025, 'Optimizing measurement accuracy in microscope-based reflectometry for thin film optical properties', Measurement Science and Technology, vol. 36, no. 7, 075001, pp. 1-11. https://doi.org/10.1088/1361-6501/ade329